Lithographic Printing Plate Developer Surfactant System
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Solution Overview
Problem
Current methods for preparing lithographic printing plates require multiple steps, including water washing, which are costly, environmentally challenging, and prone to printing stains due to development scum from the photosensitive layer components.
Innovation Solution
A method involving a developer with pH between 2 and 10, containing an amphoteric surfactant and a nonionic surfactant with an alkylene oxide chain, is used to expose and process a lithographic printing plate precursor, eliminating the need for water washing and enhancing development properties by ensuring effective removal of the photosensitive layer components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a traditional aqueous strong alkali solution (pH > 11) is used for development, then the photosensitive layer is effectively removed, but the processing complexity increases and environmental burden increases due to multiple washing steps
Solution Approach 1:
The patent changes the pH parameter from traditional strong alkali (pH > 11) to weak alkali (pH 9-10.5), and modifies the chemical composition by using specific surfactants (nonionic surfactant with alkylene oxide chain and amphoteric surfactant) instead of conventional alkali agents. This parameter change enables effective development while eliminating the need for multiple washing steps, as the developed material is water-soluble and rinses cleanly
Solution Approach 2:
The patent extracts and eliminates the water washing step from the traditional multi-step development process. By formulating a developer that produces water-soluble development products, the invention removes the need for separate washing operations, simplifying the process from multiple steps (development + washing + drying) to a single development step followed by simple rinsing
2Object-affected harmful factors
If the pH of the developer is lowered to reduce environmental impact, then the development property deteriorates, but if pH is maintained high, then environmental burden increases
Solution Approach 1:
The patent uses a composite surfactant system comprising a nonionic surfactant with alkylene oxide chain (e.g., polyethylene glycol alkyl ether) and an amphoteric surfactant (e.g., alkyl betaine or amino acid derivative). This composite surfactant system maintains effective development at reduced pH (9-10.5) by providing enhanced solubilization and emulsification capabilities compared to conventional single-component systems, thereby reducing environmental burden while maintaining development property
3Manufacturing precision
If multiple processing steps including water washing are used, then complete removal of photosensitive layer components is achieved, but waste liquid generation increases
Solution Approach 1:
The patent changes the chemical parameters of the developer to produce water-soluble development products. By using weak alkali pH (9-10.5) and specific surfactants, the developed photosensitive layer material becomes highly water-soluble, allowing complete removal with minimal or no separate washing steps, thereby eliminating waste liquid generation from multiple washing operations
Solution Approach 2:
The patent extracts and eliminates the water washing step from the traditional process. The developer formulation ensures that development products are inherently water-soluble and can be removed by simple rinsing or even air drying in some cases, removing the need for water washing baths and eliminating the associated waste liquid
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the processing to a single step, reduces waste, improves printing durability, and prevents printing stains by ensuring complete removal of the photosensitive layer components, resulting in a high-quality lithographic printing plate.
Implementation Method 1
exposing a lithographic printing plate precursor comprising a photosensitive layer containing (A) a polymerization initiator, (B) a polymerizable compound
Implementation Method 2
the developer is a developer which has pH from 2 to less than 10 and contains an amphoteric surfactant and a nonionic surfactant having an alkylene oxide chain
Data Source
Figure 1
AI summary
By a method of preparing a lithographic printing plate having exposing a lithographic printing plate precursor including a photosensitive layer containing (A) a polymerization initiator, (B) a polymerizable compound, (C) a sensitizing dye and (D) a binder polymer and a protective layer in this order on a hydrophilic support with laser and then removing the protective layer and an unexposed area of the photosensitive layer in the presence of a developer, in which the developer is a developer which has pH of from 2 to less than 10 and contains an amphoteric surfactant and a nonionic surfactant having an alkylene oxide chain, a simple processing of one solution and one step which does not require a water washing step becomes possible, excellent development property is achieved and a lithographic printing plate which has good printing durability and does not cause printing stain can be provided.