Lithographic Patterning Device Micro-Slip Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Lithographic apparatuses face challenges in maintaining accurate pattern transfer due to slippage of patterning devices during high-speed operations, which limits acceleration and maximum size of the patterning device, affecting performance and resolution.
Innovation Solution
Applying a substantially dynamic force to enable micro-slipping of the patterning device after initial stationary force application, allowing for alignment and improved friction distribution between the patterning device and support, thereby reducing slippage and enhancing holding stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the patterning device is subjected to higher accelerations to increase processing speed, then productivity is improved, but the patterning device is subjected to higher forces that cause slippage with respect to the support
Solution Approach 1:
The patent applies a preliminary stationary force to hold the patterning device to the support before subjecting it to dynamic accelerations. This preliminary attachment ensures that the patterning device is securely held during high-speed operations, preventing slippage while enabling increased processing speed and productivity.
2Adaptability or versatility
If the size of the patterning device is increased to handle more complex chip structures, then adaptability is improved, but the resolution and accuracy of pattern projection becomes more difficult to achieve
Solution Approach 1:
The patent applies a preliminary stationary force to attach the patterning device to the support before dynamic operations begin. This ensures that even large patterning devices used for complex chip structures maintain high pattern projection accuracy and resolution during high-speed processing, resolving the contradiction between device size and manufacturing precision.
3Ease of operation
If a mechanical clamp or other holding mechanism is used to hold the patterning device, then ease of operation is improved, but the achievable acceleration is limited due to slippage risk
Solution Approach 1:
The patent applies a preliminary stationary force to hold the patterning device to the support before subjecting it to dynamic accelerations. This preliminary attachment eliminates slippage risk during high-speed operations, allowing the system to achieve higher accelerations while maintaining ease of operation through the same holding mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces micro-slippage, improves friction distribution, and maintains pattern accuracy during high-speed operations, allowing for increased acceleration and larger patterning device sizes without compromising performance.
Implementation Method 1
Thereby, a force (in general a substantially stationary force) is applied between the patterning device and the support to be able to hold the patterning device
Data Source
AI summary
A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.