Lithographic Source Energy Control via Segmented Circuits
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Solution Overview
Problem
Conventional lithographic apparatuses face challenges in accurately controlling the energy of multiple pulsed radiation sources to ensure consistent energy delivery for substrate patterning, particularly in applications like integrated circuit manufacturing, where precise energy control is crucial for pattern transfer.
Innovation Solution
A controller system comprising multiple control circuits connected to each radiation source, which determines and adjusts the energy of radiation pulses based on properties specific to each source, ensuring that each pulse meets a predetermined energy tolerance for precise substrate exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple pulsed radiation sources are used to illuminate the substrate surface, then the productivity of the lithographic apparatus is improved, but the manufacturing precision deteriorates due to difficulty in controlling energy consistency across multiple sources
Solution Approach 1:
The system divides the control function into separate control circuits for each radiation source. Each control circuit independently monitors and adjusts the energy of its associated radiation source, allowing multiple sources to operate simultaneously while maintaining individual energy consistency through segmented control.
Solution Approach 2:
The control circuits implement feedback control by continuously monitoring the energy output of each radiation source and adjusting operational parameters to maintain energy within a predetermined tolerance range. This feedback mechanism ensures that even with multiple independent sources, energy consistency is maintained across all sources.
2Productivity
If multiple pulsed radiation sources are used, then the productivity is improved, but the device complexity increases due to multiple control circuits required
Solution Approach 1:
The control system is segmented into modular control circuits, where each circuit is responsible for a specific radiation source. This modular approach allows the system to scale with multiple sources while keeping each control unit relatively simple and manageable, rather than requiring a single complex centralized controller.
Solution Approach 2:
The control circuits are designed with universal functionality to handle multiple radiation sources using the same control architecture and algorithms. This universality reduces overall system complexity by reusing the same control logic across different sources rather than requiring specialized control for each source type.
3Manufacturing precision
If energy control is implemented for each radiation source, then the manufacturing precision is improved, but the device complexity increases
Solution Approach 1:
The control system applies local quality control by tailoring the energy adjustment parameters specific to each radiation source's characteristics. Each control circuit is configured with source-specific parameters and properties, allowing precise energy control adapted to the unique characteristics of each source while maintaining a standardized control architecture.
Data Source
AI summary
A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.