Lithographic Stage Positioning via Reflective Shape Correction

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current lithographic apparatuses face challenges in achieving accurate positioning of stages, which directly impacts the projection accuracy of patterns onto substrates due to inaccuracies in reflective surfaces used by optical position sensors.

Innovation Solution

Incorporating an optical shape sensor to determine the shape of reflective surfaces, allowing for precise correction of position measurements by the optical position sensor, thereby enhancing the accuracy of stage positioning.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If an optical position sensor is used to determine the position of the stage, then the positioning capability is provided, but the measurement precision is limited due to inaccuracies in the reflective surface

Engineering Contradiction:
Improveposition measurement accuracyVSAvoidreflective surface accuracy
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

An optical shape sensor is introduced as an intermediary device to measure the shape of the reflective surface. This separate measurement capability allows the position sensor to function without being directly affected by reflective surface inaccuracies, as the shape information can be used to compensate for or correct position measurements.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system implements feedback by using the shape measurement data from the optical shape sensor to correct or compensate for position measurement errors. The measured shape information feeds back into the position determination process, improving overall measurement precision by accounting for reflective surface deviations.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If the stage positioning system uses a reflective surface as reference, then the positioning function is enabled, but the manufacturing precision is reduced due to deviations in the reflective surface shape

Engineering Contradiction:
Improveoverlay accuracyVSAvoidreflective surface shape accuracy
Core Design Contradiction:
Manufacturing precisionVSShape

Solution Approach 1:

The optical shape sensor acts as an intermediary that independently characterizes the reflective surface shape. This allows the positioning system to account for shape deviations without requiring the reflective surface itself to be perfectly accurate, thereby maintaining manufacturing precision despite surface imperfections.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

Shape measurement feedback is used to correct position measurements, ensuring that overlay accuracy is maintained even when the reflective surface has shape deviations. The system continuously monitors and compensates for shape changes that would otherwise degrade manufacturing precision.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables more accurate stage positioning, improving the overlay accuracy of patterns projected onto substrates by accounting for deviations in the reflective surface shape, leading to better manufacturing outcomes in semiconductor production.

Implementation Method 1

one of the stage and the reference structure comprises a reflective surface, an optical position sensor arranged at the other one of the stage and the reference structure and configured to determine a position of the reflective surface relative to the optical position sensor

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

an optical shape sensor configured to determine a shape of the reflective surface

Methodology Applied
Scientific EffectReflection: Reflection

Data Source

PatentUS11556066B2Stage system and lithographic apparatus
Publication Date: 2023.01.17 ASML NETHERLANDS BV
  • US11556066B2 patent drawing
  • US11556066B2 patent drawing
  • US11556066B2 patent drawing

AI summary

The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (IF1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.