Lithographic Illumination Uniformity Correction Using Thermal Feedback
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Solution Overview
Problem
Existing lithographic apparatuses face challenges in maintaining radiation beam uniformity due to thermal effects, leading to lithographic errors and reduced throughput, as current uniformity correction systems are static and do not account for dynamic thermal changes.
Innovation Solution
A dynamic control system adjusts the uniformity correction system based on a thermal status criterion, using sensors to monitor and predict thermal changes in the apparatus, allowing proactive compensation for intensity profile fluctuations, thereby reducing lithographic errors while minimizing throughput impact.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a static uniformity correction system is used, then the device complexity is reduced, but the manufacturing precision deteriorates due to thermal drift effects
Solution Approach 1:
The uniformity correction system transitions from a static configuration to a dynamic one by continuously adjusting the uniformity correction elements based on real-time thermal status measurements. The control system modifies the position or shape of correction elements in response to changing thermal conditions, enabling the system to adapt to thermal drift and maintain manufacturing precision without excessive complexity
Solution Approach 2:
A feedback loop is implemented where thermal status sensors monitor the thermal state of the lithographic apparatus, and this information is fed to a control system that adjusts the uniformity correction elements accordingly. This closed-loop feedback mechanism enables the system to compensate for thermal drift effects dynamically, maintaining radiation beam uniformity while managing system complexity through intelligent control
2Manufacturing precision
If uniformity correction is performed frequently, then the manufacturing precision is improved, but the productivity deteriorates due to reduced throughput
Solution Approach 1:
Instead of continuous correction, the system performs uniformity corrections at periodic intervals based on thermal status thresholds. The control system monitors thermal conditions and triggers corrections only when thermal drift exceeds acceptable limits, thereby maintaining manufacturing precision while minimizing interruptions to substrate throughput and preserving productivity
3Manufacturing precision
If thermal compensation is implemented dynamically, then the manufacturing precision is improved, but the device complexity increases
Solution Approach 1:
A control system acts as an intermediary between thermal status sensors and uniformity correction elements. This intermediary layer processes thermal measurements, determines appropriate corrections, and actuates correction elements accordingly. The intermediary control system manages the complexity by providing a structured interface that coordinates sensor data with correction actions, enabling dynamic thermal compensation without excessive overall system complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively maintains radiation beam uniformity by dynamically adjusting to thermal drifts, reducing lithographic errors and ensuring consistent pattern formation without significant reductions in production speed.
Implementation Method 1
a thermal status criterion which is indicative of thermal energy generated by the radiation beam
Implementation Method 2
a uniformity correction system configured to adjust an intensity profile of the radiation beam
Data Source
AI summary
A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.