Lithography Projection Objective Aspheric Lens Distribution

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Solution Overview

Problem

Lithography projection objectives require high numerical aperture and precise aberration control, often necessitating multiple aspheric lenses, which increases processing costs and complexity.

Innovation Solution

A lithography projection objective design comprising five lens groups with strategically arranged aspheric lenses, including a configuration where the first and third lens groups have negative optical power, the second and fourth lens groups have positive optical power, and the fifth lens group has zero optical power, along with an aperture stop, to reduce the number of aspheric lenses and lower manufacturing costs while maintaining high imaging performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If multiple aspheric lenses are used to achieve high numerical aperture and control aberration, then imaging performance is improved, but processing cost and device complexity increase

Engineering Contradiction:
Improveimaging performanceVSAvoidnumber of aspheric lenses
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the optical parameters of the lens system by introducing a lens with zero optical power (fifth lens group) and carefully distributing optical power between positive and negative lens groups. This parameter optimization allows achieving high numerical aperture (0.5 or greater) and controlling aberration within reasonable ranges while using fewer aspheric lenses (4-8 lenses total), thereby reducing processing cost and device complexity while maintaining imaging performance

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent segments the lens system into five distinct lens groups with specific optical power assignments: first and third lens groups have negative optical power, second and fourth lens groups have positive optical power, and the fifth lens group has zero optical power. This segmentation allows each group to perform specific functions in aberration correction and numerical aperture optimization, reducing the overall need for multiple aspheric lenses

Inventive Principle:
Principle #1Segmentation

2Reliability

If more aspheric lenses are used to achieve larger numerical aperture, then imaging performance is improved, but manufacturing cost increases

Engineering Contradiction:
Improveimaging performanceVSAvoidprocessing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent optimizes optical parameters to achieve numerical aperture of 0.5 or greater and controlled aberration using a reduced number of aspheric lenses (4-8 lenses). By introducing the fifth lens group with zero optical power and distributing optical power across multiple groups, the system maintains high imaging performance while minimizing the count of expensive aspheric lenses, thereby reducing manufacturing and measurement costs

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The design achieves a high numerical aperture of up to 0.82 with reduced manufacturing and measurement costs, improving the efficiency and cost-effectiveness of lithography projection objectives by minimizing the number of aspheric lenses and maintaining good aberration correction capabilities.

Implementation Method 1

a first lens group, a second lens group, a third lens group, a fourth lens group, and a fifth lens group are sequentially arranged along an optical axis; the first lens group and the third lens group each has a negative optical power, the second lens group and the fourth lens group each has a positive optical power

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentUS11899181B2Lithography projection objective
Publication Date: 2024.02.13 SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
  • US11899181B2 patent drawing
  • US11899181B2 patent drawing
  • US11899181B2 patent drawing

AI summary

Provided a lithography projection objective includes: first lens group, second lens group, third lens group, fourth lens group, and fifth lens group, wherein first lens group, second lens group, third lens group, fourth lens group, and fifth lens group are sequentially arranged along an optical axis; first lens group and third lens group each has negative optical power, second lens group and fourth lens group each has positive optical power, fifth lens group has optical power of 0, sum optical power of first lens group, second lens group, third lens group, fourth lens group, and fifth lens group is 0; lithography projection objective further includes diaphragm; and first lens group, third lens group, and fourth lens group each comprises aspheric lenses, one aspheric lens thereof includes an aspherical surface; and a number of aspheric lenses is greater than or equal to 4 and less than or equal to 8.