Lithography Process Model Using Average Optical Aberration
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Solution Overview
Problem
Optical aberrations in lithographic apparatuses can significantly impact the accuracy and consistency of the patterning process, leading to variations in critical dimension (CD) across the exposure field, which existing technologies fail to adequately address due to the need for apparatus-specific corrections that limit the applicability of patterning devices.
Innovation Solution
A method involving the generation of a process model that accounts for the average optical aberration of multiple lithographic apparatuses, allowing for adjustments to be made to the patterning process parameters to compensate for these aberrations, thereby improving pattern fidelity and consistency across different apparatuses.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If apparatus-specific optical aberration corrections are applied, then manufacturing precision improves for individual apparatuses, but adaptability deteriorates because patterning devices become limited to specific apparatuses
Solution Approach 1:
The patent changes the parameter from apparatus-specific aberration values to average aberration characteristics across multiple apparatuses. By determining average optical aberration parameters that represent a group of apparatuses rather than individual ones, the solution achieves both improved manufacturing precision through systematic correction and enhanced adaptability by making patterning devices compatible with multiple apparatuses in the group.
Solution Approach 2:
The patent creates a universal correction approach where a single set of average optical aberration parameters can be applied across multiple lithographic apparatuses. This allows patterning devices to be used with any apparatus in the group without requiring apparatus-specific customization, achieving multi-functionality and broad applicability while maintaining correction effectiveness.
2Manufacturing precision
If optical aberrations are corrected, then pattern fidelity improves, but process complexity increases due to additional measurement and calculation steps
Solution Approach 1:
The patent merges the optical aberration characteristics of multiple apparatuses into a single average set of parameters. Instead of treating each apparatus separately with its own correction parameters, the solution combines them into a unified average model, reducing the number of correction steps needed while maintaining pattern fidelity across the apparatus group.
Solution Approach 2:
The patent performs preliminary determination of average optical aberration parameters that represent multiple apparatuses before actual patterning operations. By establishing these average parameters in advance, the solution eliminates the need for repeated individual apparatus measurements and calculations during production, thereby reducing process complexity while maintaining correction accuracy.
3Adaptability or versatility
If average optical aberration modeling is implemented, then device versatility improves across multiple apparatuses, but measurement precision requirements increase to accurately capture average characteristics
Solution Approach 1:
The patent implements a feedback mechanism where optical aberration measurements from multiple apparatuses are collected and used to determine average characteristics. This feedback loop allows the system to iteratively refine the average aberration parameters, ensuring measurement precision is maintained while enabling broad cross-apparatus usability through the universal average model.
Data Source
AI summary
A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.