Lithography Base Positioning for Vacuum Chamber Deformation
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Solution Overview
Problem
The deformation of vacuum chambers in lithography apparatuses due to pressure differences leads to changes in the relative positions between patterning devices and substrates, which are difficult to correct without increasing the weight and cost of the apparatus or overloading the stage's driving capabilities.
Innovation Solution
A lithography apparatus with a detector to monitor the relative positions between the patterning device and the base, a driving device to adjust the base, and a controller to control the driving device based on the detected positions, ensuring the relative positions meet predetermined conditions, thereby correcting for chamber deformation without relying solely on stage adjustments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If the walls of the vacuum chamber are thickened to reduce deformation, then the stability of relative positions is improved, but the weight and cost of the apparatus increase
Solution Approach 1:
The patent applies dynamics by making the vacuum chamber deformable rather than rigid, and by introducing active compensation mechanisms (position detection and base adjustment) to dynamically counteract the deformation effects, allowing thin-walled chambers to maintain positional stability through control systems
Solution Approach 2:
The patent implements feedback by using position detection means to continuously monitor the relative positions between the patterning device and substrate, and by using this information to control the base position, creating a closed-loop system that compensates for chamber deformation in real-time
2Manufacturing precision
If the stage is used to correct relative positions, then the manufacturing precision is improved, but the driving stroke requirements increase
Solution Approach 1:
The patent segments the position correction function between two independent components: the stage maintains substrate positioning while the base handles chamber deformation compensation. This division allows each component to optimize its function without excessive stroke requirements
Solution Approach 2:
The base acts as an intermediary element between the vacuum chamber and the stage, absorbing the deformation effects through its adjustable position while protecting the stage from excessive movement requirements
3Reliability
If the relative positions change due to chamber deformation, then the reliability of patterning is worsened, but increasing chamber wall thickness is not desirable
Solution Approach 1:
The system performs self-service by automatically detecting position changes and adjusting the base position to compensate, eliminating the need for manual intervention or overly complex mechanical structures while maintaining patterning reliability
Data Source
AI summary
The present invention provides a lithography apparatus that forms a pattern on a substrate, the apparatus comprising a base, a stage configured to hold the substrate and be movable above the base with the stage supported by the base, a patterning device configured to perform patterning on the substrate held by the stage, a chamber housing the base and the stage, and supporting the patterning device, a detector configured to obtain information of relative positions between the patterning device and the base, a driving device configured to move the base, and a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.