Lithography Cleaning Liquid Using Mixed Organic Solvents
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Solution Overview
Problem
Current cleaning solutions for lithography lack universal applicability, effective dissolving and removal capabilities, dryability, and safety, often failing to remove resist patterns from various coating films without affecting the necessary film or causing environmental harm.
Innovation Solution
A cleaning solution comprising a mixture of ketone organic solvents, glycol ether organic solvents, and alkoxybenzenes or aromatic alcohols, with specific content ranges, is used to effectively remove resist patterns from various coating films without affecting the necessary film or causing environmental harm.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a single-component cleaning solution or simple solvent mixture is used, then the cleaning solution is simple and low cost, but it lacks universal applicability and effective dissolving capability for various coating films
Solution Approach 1:
The patent applies composite materials by formulating a cleaning solution that combines multiple solvents with different chemical properties (polar and non-polar solvents) to create a composite cleaning agent that can effectively dissolve various types of coating films including water-soluble, alcohol-soluble, and organic solvent-soluble films, thereby achieving universal applicability while maintaining reasonable complexity
2Productivity
If a strong cleaning solution is used to effectively remove resist patterns, then cleaning capability is improved, but it may affect the shape of the residual film or cause environmental harm
Solution Approach 1:
The patent applies parameter changes by carefully adjusting the composition ratios of different solvents in the cleaning solution, controlling parameters such as polarity, volatility, and chemical reactivity to achieve optimal cleaning effectiveness while minimizing harmful effects on the residual film and environment
Solution Approach 2:
The patent applies local quality by selecting solvents with specific properties that target different types of contaminants locally - polar solvents for water-soluble coatings and non-polar solvents for organic solvent-soluble coatings - allowing effective removal of various coating films while maintaining gentle conditions that preserve the residual film's integrity
3Reliability
If multiple cleaning solutions are used for different cleaning purposes, then cleaning effectiveness for specific purposes is improved, but the number of supply pipes and system complexity increases
Solution Approach 1:
The patent applies universality by developing a multi-functional cleaning solution that can perform multiple cleaning tasks - removing water-soluble coating films, alcohol-soluble coating films, and organic solvent-soluble coating films - using a single solution formulation, thereby eliminating the need for multiple separate cleaning solution supply systems and reducing overall system complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides excellent cleaning capability, dryability, and safety, allowing for efficient removal of resist patterns from different coating films without altering the shape of the residual film, while being environmentally and human-safe, and cost-effective.
Implementation Method 1
a cleaning solution for lithography characterized by containing an organic solvent mixture which is a combination consisting of (A) at least one kind of solvent selected from ketone organic solvents and glycol ether organic solvents, (B) at least one kind of solvent selected from lactone organic solvents and (C) at least one kind of solvent selected from alkoxybenzenes and aromatic alcohols
Data Source
AI summary
Disclosed is a cleaning liquid for lithography which is characterized by containing a mixed organic solvent which is obtained by mixing (A) at least one solvent selected from ketone organic solvents and glycol ether organic solvents, (B) at least one solvent selected from lactone organic solvents and (C) at least one solvent selected from alkoxy benzenes and aromatic alcohols. This cleaning liquid is highly safe and does not have adverse effects on the environment or the human body, while having basic characteristics necessary for a cleaning liquid for lithography. In addition, this cleaning liquid can be stably supplied at low cost.