Lithography Cluster Network Architecture for Control Data Delivery
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current network architectures for clustered lithography systems face challenges in timely delivery of critical control data and efficient data collection due to increasing complexity and volume of information, which existing solutions have proven insufficient.
Innovation Solution
A network architecture that separates control and data services, using a control network for communication between lithography subsystems and a data network for logging information, with a cluster front-end for interfacing with operator consoles and host systems, allowing for independent operation of each lithography element and efficient data transmission and storage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If control and data services are combined into a single network, then network simplicity is maintained, but timely delivery of critical control data deteriorates due to data traffic congestion
Solution Approach 1:
The patent divides the network into two separate networks: a control network for transmitting control commands and a data network for collecting data. This segmentation allows critical control data to be transmitted without being congested by large volumes of data traffic, thereby ensuring timely delivery while maintaining overall network manageability through standardized protocols at each node.
Solution Approach 2:
The patent introduces intermediary devices (control units and data collection units) that act as mediators between the lithography subsystems and the central control. These intermediaries buffer and manage data flows, separating control traffic from data collection traffic and preventing congestion on either network.
2Productivity
If lithography machines are clustered to increase production volume, then productivity improves, but information transmission complexity worsens due to increased data volume
Solution Approach 1:
The patent implements a hierarchical network architecture where each lithography element in the cluster has its own control and data collection units, segmenting the overall system into manageable units. This allows each element to be controlled and monitored independently, reducing the complexity of information transmission across the entire cluster while enabling high-volume production through parallel operation of multiple elements.
Solution Approach 2:
The patent organizes the cluster network in a hierarchical dimension with multiple levels: individual lithography subsystems, element control units, data collection units, and central control. This dimensional organization allows efficient local processing at each level while managing overall cluster coordination, thereby handling increased data volumes from high-volume production without proportionally increasing transmission complexity.
3Productivity
If data logging from multiple lithography subsystems is centralized, then data collection efficiency improves, but network bandwidth consumption increases
Solution Approach 1:
The patent divides data collection into segments handled by individual data collection units at each lithography element, rather than requiring all data to traverse a single centralized path. Each data collection unit independently collects and buffers data from its associated subsystems, then transmits aggregated data to the central system. This segmentation reduces peak bandwidth requirements on any single network link while maintaining efficient centralized access to all data.
Data Source
Figure 1
Figure 2
Figure 3~4
AI summary
A clustered substrate processing system comprising a plurality of lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system, the cluster front-end arranged for transmitting control information to the at least one machine control unit to control operation of the lithography subsystems for exposure of one or more wafers, and the front-end further arranged for receiving at least a portion of the data logging information received by the data network hub.