Lithography Controller Group Allocation for Throughput
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Solution Overview
Problem
Cluster-type imprint apparatuses face challenges in maintaining high productivity due to difficulties in complex pattern shape correction and pattern transfer errors, and the existing process control solutions are not adaptable to typical production lines without significant changes in MES and conveyance equipment.
Innovation Solution
A lithography apparatus with a controller that manages processing units in groups based on pattern formation characteristics, allocates substrates accordingly, and enables parallel processing to reduce standby times and improve pattern formation accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a cluster-type imprint apparatus is used to improve productivity, then the overall throughput increases, but pattern transfer accuracy deteriorates due to module characteristic mismatches
Solution Approach 1:
The system segments the cluster apparatus into multiple groups based on module characteristics, allowing each group to handle substrates with matching properties. This segmentation enables parallel processing across groups while maintaining precision within each group, resolving the contradiction between throughput and accuracy.
Solution Approach 2:
The system dynamically assigns substrates to groups and processes them based on real-time module availability and substrate requirements. This dynamic allocation allows the system to maintain high accuracy by matching substrate characteristics with appropriate modules while maximizing overall productivity through flexible resource utilization.
2Manufacturing precision
If substrates are fixed to individual modules in advance to maintain pattern transfer accuracy, then manufacturing precision improves, but productivity deteriorates due to module standby states
Solution Approach 1:
The system implements dynamic substrate allocation where substrates are not permanently assigned to specific modules but are flexibly assigned based on real-time conditions. This allows modules to process substrates continuously without prolonged standby periods while maintaining accuracy through characteristic matching.
Solution Approach 2:
By implementing parallel processing across multiple groups and dynamically allocating substrates as modules become available, the system ensures continuous useful action without idle standby periods, maintaining both high productivity and pattern transfer accuracy.
3Manufacturing precision
If process control apparatus is applied to manage module-lot relationships, then pattern formation accuracy improves, but device complexity increases due to MES and conveyance equipment changes
Solution Approach 1:
The controller within the existing cluster apparatus performs multiple functions including group management, substrate allocation, and process coordination. This multi-functionality achieves process control capabilities without requiring separate MES systems or complex conveyance equipment, maintaining simplicity while improving precision.
Solution Approach 2:
The cluster apparatus manages its own module-lot relationships through internal controller logic that automatically groups modules by characteristics and allocates substrates appropriately. This self-service capability eliminates the need for external complex control systems while maintaining high pattern formation accuracy.
Data Source
AI summary
Provided is a lithography apparatus that has a plurality of processing units each of which configured to perform processing of pattern formation for substrates. The lithography apparatus also has a controller configured to manage the plurality of processing units as groups in accordance with characteristics of the pattern formation respectively, allocate the substrates included in one or more lots to one of the groups, and, if an unprocessed substrate allocated to the group still exist upon a standby state of a processing unit included in the group, allocate the unprocessed substrate to the processing unit in the standby state and then cause the processing units to perform parallel processing for the substrates based on the allocation.