Digital Lithography Data Inspection Checksum Verification
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Solution Overview
Problem
Conventional digital lithography systems are slow and resource-intensive due to the massive amount of data involved in transforming customer design data into printed circuitry, requiring repetitive comparisons that are inefficient.
Innovation Solution
A method and system for data inspection in digital lithography that involves obtaining a data prep bitmap, optimizing it at an EYE server to create an EYE server bitmap, comparing the bitmaps, processing the EYE server bitmap with a rasterizer to create an EYE bitmap, and generating and comparing checksums to ensure data integrity and accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional data inspection methods are used in digital lithography systems, then data integrity can be maintained through repetitive comparisons, but the system becomes extremely slow and resource intensive
Solution Approach 1:
The patent extracts and compares only the most critical data elements between customer design data and printed circuit data, rather than performing repetitive comparisons of all design primitives. This selective extraction maintains data integrity verification while dramatically reducing processing time and resource consumption.
Solution Approach 2:
The patent segments the data comparison process into distinct stages: obtaining customer design data, transforming it through the digital lithography system, and then comparing specific key elements between the original and final data sets. This segmentation allows for efficient verification at critical checkpoints rather than continuous comparison throughout the entire transformation process.
2Manufacturing precision
If conventional data inspection methods are used, then data accuracy can be verified through repetitive comparisons, but the system consumes excessive computational resources
Solution Approach 1:
The patent extracts only the essential data elements that must be verified for accuracy, such as key geometric features and critical dimensions, rather than comparing all design primitives repeatedly. This selective approach maintains manufacturing precision for critical features while significantly reducing computational resource consumption.
Solution Approach 2:
The patent applies partial comparison action by focusing verification efforts on the most critical data elements that directly impact manufacturing precision, rather than performing exhaustive comparisons of all data. This partial action approach ensures accuracy where it matters most while avoiding wasteful computation on less critical elements.
3Loss of information
If massive amounts of design data are processed through transformations, then complete design fidelity can be maintained, but the inspection process becomes extremely time-consuming
Solution Approach 1:
The patent performs preliminary transformations of customer design data into the format required by the digital lithography system before the inspection process. By pre-processing and organizing the data in advance, the system maintains complete design fidelity while enabling much faster inspection through optimized data structures and pre-computed comparison elements.
Solution Approach 2:
The patent extracts key verification data elements from the transformed design data that are essential for maintaining design fidelity. By identifying and comparing only these critical extracted elements rather than processing all transformed data, the system ensures design accuracy is maintained while dramatically reducing inspection time.
Data Source
AI summary
In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.