Lithography Dose Calculation via Lower Resolution Grid

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Solution Overview

Problem

High-resolution lithography systems are costly and inefficient when used for lower resolution applications due to the need for more computational resources and increased complexity in providing control signals for programmable patterning devices.

Innovation Solution

A method and apparatus that calculate target dose values at a lower resolution grid, allowing for the derivation of target dose values at the resolution of the spot exposure grid, enabling the use of high-resolution systems for lower resolution applications while reducing costs and computational requirements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If high-resolution spot exposure grid is used for lower resolution applications, then manufacturing precision is improved, but device complexity and computational requirements increase

Engineering Contradiction:

Improvedose pattern resolutionVSAvoidcomputational complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The spot exposure grid is segmented into multiple pixel groups, where each group corresponds to a single controllable element in the programmable patterning device. This allows the system to control multiple spots simultaneously rather than individually, reducing computational complexity while maintaining the ability to achieve high-resolution dose patterns through coordinated group control.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Multiple pixel groups are merged into super-pixels that can be controlled by single patterning device elements. By combining the control of multiple individual spots into unified controllable units, the system reduces the total number of control operations required while still achieving the desired dose distribution across the substrate.

Inventive Principle:

Principle #5Merging (Combining)

2Manufacturing precision

If high-resolution lithography systems are used for lower resolution applications, then manufacturing precision is improved, but productivity decreases due to increased computational requirements

Engineering Contradiction:

Improvepattern resolutionVSAvoidexposure throughput

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patterning device is divided into multiple independently controllable elements, each capable of directing radiation to multiple pixel groups simultaneously. This segmentation enables parallel processing of multiple regions of the substrate, increasing throughput while maintaining precision through coordinated control of the segmented elements.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system maintains continuous exposure action by enabling each patterning device element to control multiple pixel groups in sequence or parallel without requiring reconfiguration between exposures. This continuity eliminates idle time and computational overhead associated with reconfiguring for each individual spot, thereby improving productivity.

Inventive Principle:

Principle #20Continuity of useful action

3Adaptability or versatility

If high-resolution systems are reconfigured for lower resolution applications, then adaptability is improved, but device complexity increases

Engineering Contradiction:

Improveresolution flexibilityVSAvoidsystem reconfiguration complexity

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The system employs dynamic control of the programmable patterning device elements, where each element can be independently programmed to control different numbers and arrangements of pixel groups based on the required resolution. This dynamic reconfigurability allows the system to adapt to different resolution requirements without physical reconfiguration, maintaining simplicity while achieving versatility.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

Each controllable element in the programmable patterning device is designed to perform multiple functions by controlling different pixel groups for different resolution requirements. This multi-functionality allows a single high-resolution system to serve both high-resolution and lower-resolution applications without requiring separate systems or complex reconfiguration mechanisms.

Inventive Principle:

Principle #6Universality (Multi-functionality)

Data Source

PatentUS9354502B2Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program

Publication Date: 2016.05.31 ASML NETHERLANDS BV

AI summary

An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.