Multiple Charged Particle Beam Lithography Dose Modulation Map Segmentation
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Solution Overview
Problem
In multiple charged particle beam lithography, positional and dimensional displacements in patterns due to beam positional displacement lead to reduced data processing speed and throughput, as existing dose modulation maps require extensive data processing and memory access, causing memory bandwidth issues.
Innovation Solution
A multiple charged particle beam lithography apparatus and method that calculates and applies dose modulation values for each pixel region to correct positional displacements, creating a dose modulation map and operating the incident dose efficiently by dividing the correction map into blocks, allowing continuous data reuse without switching between block data sets.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a dose modulation map is created to correct positional displacement of beams in multiple beams pattern writing, then manufacturing precision is improved, but data processing speed deteriorates due to large data volume and frequent memory access
Solution Approach 1:
The dose modulation map data is divided into multiple blocks in memory, with each block containing dose modulation values for a specific region. This segmentation allows the system to load and process smaller data portions sequentially, reducing the overall memory access time and bandwidth requirements while maintaining the ability to correct positional displacements across the entire pattern writing region
Solution Approach 2:
The dose modulation map is pre-calculated and stored in memory before the actual pattern writing process begins. By preparing the correction data in advance and organizing it into blocks, the system eliminates the need for real-time calculations during pattern writing, thereby improving data processing speed without sacrificing manufacturing precision
2Manufacturing precision
If dose modulation values are calculated for each pixel region to correct beam displacement, then manufacturing precision is improved, but device complexity increases due to extensive data processing requirements
Solution Approach 1:
The pattern writing region is divided into multiple pixel regions, and the dose modulation map is organized into corresponding blocks. This segmentation allows the writing control unit to process and apply dose modulation values in a structured, sequential manner, reducing the computational complexity while maintaining the ability to correct both positional and dimensional displacements with high precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances data processing speed and improves throughput by reducing memory access demands and optimizing dose modulation operations, effectively correcting positional and dimensional displacements in pattern writing.
Implementation Method 1
the plurality of beams are subjected to reducing control by an objective lens
Implementation Method 2
deflected by a deflector before being shot at a desired position on a target object
Implementation Method 3
a positional displacement of beam could arise due to a distortion of the optical system, a displacement of an aperture plate array to form multiple beams from design values, and/or the Coulomb effect
Data Source
AI summary
According to one aspect of the present invention, a multiple charged particle beam lithography apparatus includes dose operation processing circuitry configured to, in a case that a pattern is written into a pattern writing region sufficiently larger than the setting region in a target object by using the multiple charged particle beams following the pattern writing sequence, operate an incident dose of a beam to each position intended inside the pattern writing region by continuously using repeatedly data of dose modulation value groups defined for a plurality of pixel regions of a same block among a plurality of blocks obtained by dividing a dose modulation map for each preset number of pixel regions without switching to data of dose modulation value groups of other blocks.