Lithography Process Correction Using Iterative Dual-Model Feedback
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Solution Overview
Problem
Existing lithography apparatuses face challenges in adjusting processing conditions when a new function is added, as the method to change the processing condition for deviating results is unclear, especially if the correction data for the processing condition related to the new function is unclear.
Innovation Solution
An information processing apparatus is developed that uses a first system to output correction data by inputting processing results, which includes a first model for generating correction data based on input processing results and a second model for outputting processing results when the condition is input, allowing the system to correct and output the data iteratively until the processing results fall within a predefined allowable range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a new function is added to a lithography apparatus, then the functionality and capability of the apparatus is improved, but the clarity of the correction data acquisition unit for processing conditions becomes unclear
Solution Approach 1:
The external system is designed to universally manage multiple types of processing conditions across different functions and units of the lithography apparatus. Instead of having separate correction data acquisition units for each function, a single external system handles correction data for all processing conditions, making the system adaptable to new functions without increasing complexity.
2Manufacturing precision
If the processing condition is changed to correct deviating results, then the manufacturing precision is improved, but the difficulty of determining the correction method increases when the acquisition unit is unclear
Solution Approach 1:
The external system acts as an intermediary between the lithography apparatus and the correction data. It receives processing results, determines the appropriate processing conditions to be corrected, acquires the necessary correction data, and provides it back to the apparatus. This mediator approach simplifies the correction process by centralizing the decision-making logic.
Solution Approach 2:
The system implements a feedback loop where processing results are continuously monitored, compared against targets, and used to trigger corrective actions. When a deviation is detected, the external system automatically determines the appropriate correction and provides updated processing conditions, creating a closed-loop control system that continuously improves manufacturing precision.
3Adaptability or versatility
If the correction data is acquired from an external system, then the adaptability to new functions is improved, but the system complexity increases
Solution Approach 1:
The correction data acquisition functionality is extracted from the lithography apparatus itself and placed in a separate external system. This extraction allows the apparatus to remain relatively simple while gaining the flexibility of an independent correction management system that can be updated and configured without modifying the core lithography equipment.
Data Source
AI summary
An information processing apparatus outputs correction data using a first system that outputs the correction data for correcting a condition defining processing to be performed in a lithography apparatus that forms a pattern onto a substrate. The first system includes a first model that outputs the correction data in case where a processing result indicating a result of the processing is input, and a second model that outputs the processing result in case where the condition is input. The first system corrects the condition using the correction data output from the first model, and outputs the correction data based on the processing result output by inputting the corrected condition to the second model.