Lithography Metrology Frame for Vibration-Resistant Position Measurement
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Solution Overview
Problem
Current lithography systems face challenges in accurately measuring the position of substrates relative to pattern generators due to environmental factors, leading to issues like mura and blurriness in images, and are costly and vulnerable to vibrations.
Innovation Solution
A substrate processing apparatus with guiderails, shuttles, and metrology bars equipped with sensors that provide precise positional feedback to a processing unit, enabling accurate alignment and correction of substrate position during lithography processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If laser interferometers are used to determine substrate position, then measurement capability is provided, but the system becomes expensive and vulnerable to environmental factors such as vibration and air path changes
Solution Approach 1:
The patent extracts the measurement function from the vulnerable laser interferometer system and implements it through a simplified metrology bar with sensors that directly measure substrate position without being susceptible to environmental interference. The metrology bar is mechanically coupled to the substrate table and provides direct positional feedback.
Solution Approach 2:
The patent replaces expensive laser interferometers with a more cost-effective metrology bar system using standard sensors. While the laser interferometer provides high precision, the metrology bar offers sufficient accuracy at lower cost and with greater environmental robustness.
2Measurement precision
If laser interferometers are used to determine substrate position, then measurement capability is provided, but the system cost increases significantly
Solution Approach 1:
The patent replaces expensive laser interferometers with a more cost-effective metrology bar system using standard sensors. While the laser interferometer provides high precision, the metrology bar offers sufficient accuracy at lower cost and with greater environmental robustness.
Solution Approach 2:
The patent extracts the measurement function from the vulnerable laser interferometer system and implements it through a simplified metrology bar with sensors that directly measure substrate position without being susceptible to environmental interference.
3Device complexity
If substrate position is not accurately measured, then system complexity is reduced, but image quality deteriorates due to mura and blurriness
Solution Approach 1:
The patent introduces a metrology bar as an intermediary element between the substrate table and the control system. This metrology bar with integrated sensors provides the necessary positional feedback without requiring complex laser interferometer infrastructure, thus maintaining image quality while reducing system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves precise patterning by minimizing vibration-induced errors and providing real-time positional feedback, enhancing image clarity and reducing costs.
Implementation Method 1
Current lithography systems often employ laser interferometers to determine the position of the substrate relative to the pattern generator
Data Source
AI summary
The present disclosure relates to apparatus and methods for performing maskless lithography processes. A substrate processing apparatus includes a slab with a plurality of guiderails coupled to and extending along the slab. A first shuttle is disposed on the plurality of guiderails, a second shuttle is disposed on the first shuttle, and a metrology bar is coupled to the second shuttle. The metrology bar includes a first plurality of sensors coupled to the metrology bar. A second plurality of sensors coupled to the metrology bar are disposed laterally inward of the first plurality of sensors.