Lithography Mirror Cooling Bypass for Flow Vibration Isolation
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Solution Overview
Problem
Existing projection exposure apparatuses for semiconductor lithography face challenges in maintaining imaging quality due to flow-induced vibrations in fluid channels, which cause mirror deformations and positional changes, leading to disturbances in the imaging process.
Innovation Solution
A projection exposure apparatus with a fluid channel connected to a supply line and outgoing line via a short circuit, which equalizes pressure differences and absorbs disturbances, reducing mirror displacements and deformations by decoupling the flow-induced vibrations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If water cooling is used to regulate mirror temperature, then thermal load is dissipated effectively, but flow-induced vibrations cause mirror deformations and positional changes
Solution Approach 1:
A vibration isolation table is introduced as an intermediary component between the mirror and the fluid channel assembly. This table acts as a mechanical filter that decouples the mirror from vibration sources generated by fluid flow in the channels, allowing effective heat dissipation while preventing transmission of flow-induced vibrations to the optical element
Solution Approach 2:
The design modifies the physical parameters of the fluid channel system by optimizing channel geometry, flow velocity, and pressure characteristics to minimize vibration generation. Additionally, the vibration isolation table introduces damping parameters that reduce the amplitude of transmitted vibrations, thereby resolving the contradiction between effective cooling and imaging precision
2Reliability
If fluid channels are integrated into mirrors for cooling, then temperature regulation is achieved, but mechanical disturbances from flow-induced vibrations increase
Solution Approach 1:
The vibration isolation table serves as a mediator that separates the mirror from the fluid channel assembly. This intermediary structure allows the fluid channels to maintain close thermal coupling with the mirror for effective cooling while mechanically isolating the mirror from harmful vibrations generated by fluid flow
Solution Approach 2:
The harmful vibration-generating fluid channel assembly is extracted and separated from the mirror structure. The channels are positioned in close proximity for thermal coupling but mechanically decoupled through the vibration isolation table, extracting the harmful vibrational effects while retaining the beneficial cooling function
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively minimizes mechanical disturbances caused by flow-induced vibrations, improving imaging quality by maintaining the optical effective surface stability of mirrors.
Implementation Method 1
The mirrors can comprise fluid channels through which temperature-regulated water flows and which thereby can dissipate the heat from the optical effective surface
Implementation Method 2
the supply line and the outgoing line being connected to one another in parallel with the fluid channel via a short circuit
Data Source
AI summary
A projection exposure apparatus for semiconductor lithography includes component having a fluid channel and a device for providing a fluid for flowing through the fluid channel. The fluid channel is connected to the device via a supply line and an outgoing line. The supply line and the outgoing line are connected to one another in parallel with the fluid channel via a short circuit.