Lithography Mounting Structure for Impact Isolation and Low Particles
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Solution Overview
Problem
Existing lithography apparatuses face damage and particle generation during transport due to the collision of transport locks with sensor frames, which are mechanically decoupled but still experience high impact forces, leading to potential structural damage and operational interference.
Innovation Solution
A mounting system with fastening elements that exert forces exclusively in specific degrees of freedom, providing a spacing and securing the mounted element relative to the mounting element, preventing direct contact and minimizing torques and abrasion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If transport locks are provided between the supporting frame and the sensor frame to prevent damage during transport, then protection against impacts is improved, but the risk of collision and particle generation increases due to abrupt contact
Solution Approach 1:
The patent introduces a cushioning element positioned between the transport lock and the sensor frame that compresses during impact events. This cushioning element absorbs impact energy before the transport lock collides with the sensor frame, preventing abrupt contact and particle generation while maintaining protection against impacts during transport
2Stability of the object's composition
If the sensor frame is mechanically decoupled from the supporting frame to prevent force transmission, then vibration isolation is improved, but the sensor frame becomes more vulnerable to damage during transport
Solution Approach 1:
The patent introduces a cushioning element as an intermediary component between the mechanically decoupled sensor frame and supporting frame. This intermediary absorbs impact forces during transport while preserving the mechanical decoupling that provides vibration isolation, thus protecting the sensor frame without compromising its vibration isolation capability
3Stability of the object's composition
If a gap is provided between the transport lock and the sensor frame to allow contactless securing, then vibration isolation is maintained, but high torques during impacts cannot be prevented
Solution Approach 1:
The cushioning element serves as an intermediary that fills the gap between the transport lock and sensor frame during impact events. It maintains the contactless securing arrangement for vibration isolation while simultaneously absorbing impact forces and preventing high torques from transmitting to the sensor frame
Data Source
AI summary
A mounting for a lithography system comprises: a mounted element; a mounting element; and fastening elements which together secure the mounted element relative to the mounting element in at least one degree of freedom. A spacing is provided between the mounted element and the mounting element in the direction of the at least one degree of freedom, and each fastening element exerts a force on the mounted element exclusively in the direction of the at least one degree of freedom.