Lithography Parameter Relationship Selection for Predictive Maintenance
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Solution Overview
Problem
Lithographic apparatuses face challenges in accurately reproducing patterns with small feature sizes due to limitations in wavelength and numerical aperture, requiring sophisticated fine-tuning and maintenance, and complex relationships between parameters make it difficult to determine when maintenance is needed.
Innovation Solution
A method for determining a subset of relationships between parameters by comparing data sets from reference and further apparatuses, selecting relationships based on differences, and calculating frequency data to identify significant parameters and relationships for improved maintenance and operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If all relationships between parameters are monitored to ensure accurate pattern reproduction, then manufacturing precision is improved, but computational burden and device complexity increase
Solution Approach 1:
The patent extracts and identifies a subset of significant relationships from the complete set of parameter relationships. By using comparison between reference and further apparatuses, the method isolates only those relationships that significantly impact pattern reproduction accuracy, eliminating the need to process all relationships and thereby reducing computational burden while maintaining manufacturing precision.
Solution Approach 2:
The patent segments the comprehensive parameter relationships into two categories: significant relationships that affect pattern reproduction and non-significant relationships. This segmentation is achieved through comparative analysis between reference and further apparatuses, allowing the system to focus computational resources only on the critical subset of relationships.
2Reliability
If comprehensive parameter monitoring is implemented to determine maintenance needs, then reliability is improved, but loss of time and productivity decrease due to complex analysis
Solution Approach 1:
The patent extracts a subset of significant relationships that are most relevant to predictive maintenance. By comparing reference and further apparatuses, the method identifies only the critical parameter relationships that indicate maintenance needs, eliminating time-consuming analysis of non-critical relationships while maintaining reliable maintenance determination.
Solution Approach 2:
The patent performs preliminary comparison between reference and further apparatuses to pre-identify significant relationships before maintenance determination is needed. This preliminary action creates a ready-to-use subset of critical relationships, so that when maintenance needs assessment is required, the analysis can be performed quickly on the pre-identified significant relationships rather than analyzing all relationships from scratch.
3Manufacturing precision
If all parameter relationships are analyzed to optimize apparatus operation, then manufacturing precision is improved, but productivity decreases due to extensive computational requirements
Solution Approach 1:
The patent extracts a subset of significant relationships that directly impact pattern reproduction quality. Through comparative analysis of reference and further apparatuses, the method identifies the critical relationships that need optimization, eliminating the need to computationally process all relationships and thereby improving operational efficiency while maintaining manufacturing precision.
Solution Approach 2:
The patent applies partial action by analyzing only the significant subset of relationships rather than all relationships. This partial analysis is sufficient to achieve optimal pattern reproduction quality because the comparative method identifies the critical relationships that have the most impact on manufacturing precision, making extensive analysis of all relationships unnecessary.
Data Source
AI summary
Methods and apparatus for determining a subset of a plurality of relationships between a plurality of parameters describing operation of a lithographic apparatus, the method comprising: determining a first set of data describing first relationships between a plurality of parameters of a reference apparatus; based on one or more measurements, determining a second set of data describing second relationships between the plurality of parameters of the reference or a further apparatus; comparing the first set of data and the second set of data; and selecting from the second set of data a subset of the second relationships based on differences between the first set of data and the second set of data.