Direct Write Lithography Pattern Combination Optimization
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Solution Overview
Problem
Conventional lithographic apparatuses are limited in their flexibility and cost-effectiveness, particularly in efficiently utilizing substrates for patterning multiple devices with different resolutions and dimensions, as they often require specific masks and are not optimized for substrate utilization.
Innovation Solution
A direct write lithographic apparatus with a programmable patterning device and processing system that determines optimal combinations of patterns for substrates based on a substrate utilization criterion, allowing for flexible projection of different patterns onto a substrate, maximizing usable area and considering manufacturing constraints, defects, and production demands.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional mask-based lithographic apparatus is used, then the pattern can be transferred accurately onto the substrate, but the system lacks flexibility and requires specific masks for different patterns, increasing cost and complexity
Solution Approach 1:
The invention extracts the pattern information from physical masks and represents it digitally through data structures. The maskless lithographic apparatus uses a programmable patterning device that can be controlled by digital data to generate different patterns without requiring physical masks, thereby eliminating mask management complexity while maintaining pattern flexibility
Solution Approach 2:
The invention creates digital copies of mask patterns as data structures that can be stored, manipulated, and reproduced on demand. Instead of using physical masks, the system uses digital representations of patterns that can be programmed into the patterning device, allowing flexible pattern generation without the constraints of physical mask fabrication and management
2Productivity
If a maskless system with programmable patterning device is used, then pattern flexibility and speed are improved, but substrate utilization efficiency decreases due to inability to optimize pattern combinations
Solution Approach 1:
The invention implements dynamic pattern combination optimization by using data structures that represent multiple patterns and their spatial relationships. The system can dynamically determine optimal combinations of patterns to apply to a substrate based on the substrate's usable area and the patterns' dimensions, allowing flexible adaptation to different substrates and pattern requirements while maximizing utilization efficiency
Solution Approach 2:
The invention changes the parameter representation from fixed physical mask dimensions to flexible digital data structures that store pattern dimensions, positions, and combinations. This allows the system to optimize pattern parameters dynamically based on substrate characteristics and production requirements, improving both substrate utilization and pattern flexibility
3Area of stationary object
If multiple patterns of different sizes are projected onto a substrate, then substrate area utilization improves, but determining the optimal combination of patterns becomes computationally complex
Solution Approach 1:
The invention performs preliminary organization of pattern data by creating data structures that store pattern dimensions, positions, and compatibility information before the actual patterning process. This pre-organization allows the system to efficiently determine optimal pattern combinations by querying the structured data rather than performing complex calculations in real-time, reducing computational complexity while maximizing area utilization
Data Source
AI summary
A direct write exposure apparatus configured to process a plurality of substrates, the apparatus including: a substrate holder configured to hold a substrate having a usable patterning area; a patterning system configured to project different patterns onto the substrate; a processing system configured to: determine a first combination of one or more patterns that are to be applied on a first substrate of the plurality of substrates; and determine a second, different combination of one or more patterns that are to be applied on a second, subsequent, substrate of the plurality of substrates.