Lithography Patterning for Thin Film Solar Cells

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Solution Overview

Problem

Thin-film solar cells for indoor applications face reduced efficiency due to shunt leakage currents and patterning defects, particularly metal flakes, which are challenging to avoid in conventional laser scribing processes, especially under low light intensities.

Innovation Solution

A method involving lithography processes to form isolation and contact trenches in solar modules, reducing the probability of metal flakes and enhancing efficiency by allowing for smaller trench dimensions and flexible substrate use, thereby improving the series connection of solar cells.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If laser scribing is used to pattern material layers for series connection, then large area modules can be manufactured with automated processes, but metal flakes are generated causing shunt leakage currents that reduce cell efficiency

Engineering Contradiction:
Improveautomated manufacturingVSAvoidshunt leakage current
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent extracts and removes the harmful metal flakes from the system by using lithography to create isolation trenches that completely separate metal contacts between adjacent cells, preventing flake-induced shunt leakage while maintaining automated manufacturing capability

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces an intermediary dielectric layer filled into isolation trenches created by lithography, which acts as a barrier to prevent metal flake contact between adjacent cell regions, thereby eliminating shunt leakage paths while preserving the benefits of laser-based material removal

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of manufacture

If laser scribing is used for patterning, then series connection can be achieved, but dead areas are caused by the beam size constraint of approximately 50 to 60 μm, resulting in loss of active cell area

Engineering Contradiction:
Improveseries connection patterningVSAvoidactive cell area
Core Design Contradiction:
Ease of manufactureVSArea of stationary object

Solution Approach 1:

The patent replaces the mechanical laser beam patterning system with a lithography-based patterning system that uses photoresist and chemical etching, enabling trench widths below 50 μm and thereby increasing active cell area while maintaining ease of manufacture for series connection

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the critical parameter of trench width from 50-60 μm (laser limitation) to below 50 μm (lithography capability), thereby increasing the active cell area ratio while preserving the series connection functionality through modified patterning parameters

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If conventional patterning processes are used, then manufacturing can be simplified, but defects such as metal flakes are generated during processing of metal back side contact

Engineering Contradiction:
Improvepatterning processVSAvoiddefect generation
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent segments the patterning process into distinct lithography-based isolation trench formation and separate metal contact processing steps, preventing metal flake generation during patterning by avoiding laser processing of metal layers and thereby improving manufacturing precision

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method significantly reduces shunt leakage currents and increases the active cell area, enhancing the overall efficiency of solar modules, especially in indoor environments with low light intensities, while maintaining cost-effectiveness.

Implementation Method 1

The first isolation trench and/or the contact trench and/or the second isolation trench are formed by applying a lithography process

Methodology Applied
Scientific EffectLithography: Photography

Implementation Method 2

Thin-film solar cell technology based on appropriate semiconductive materials, such as amorphous silicon (a-Si:H), is very promising for generating low-cost solar energy

Methodology Applied
Scientific EffectPhotovoltaic effect: Photovoltaic Effect

Data Source

PatentUS10256356B2Thin film solar cell module including series connected cells formed on a flexible substrate by using lithography
Publication Date: 2019.04.09 STMICROELECTRONICS SRL
  • US10256356B2 patent drawing
  • US10256356B2 patent drawing
  • US10256356B2 patent drawing

AI summary

Solar thin film modules are provided with reduced lateral dimensions of isolation trenches and contact trenches, which provide for a series connection of the individual solar cells. To this end lithography and etch techniques are applied to pattern the individual material layers, thereby reducing parasitic shunt leakages compared to conventional laser scribing techniques. In particular, there may be series connected solar cells formed on a flexible substrate material that are highly efficient in indoor applications.