Model-Based Lithography Scanner Tuning via TCC Matching
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Solution Overview
Problem
Current lithography systems require time-consuming and costly trial-and-error processes to optimize settings for different patterns, as they exhibit unique optical proximity effects, making it difficult to image patterns consistently across various scanners.
Innovation Solution
A method for model-based scanner tuning that uses a reference model to adjust tunable parameters, minimizing Transmission Cross Coefficients (TCC) differences to achieve pattern-independent matching and tuning, eliminating the need for CD measurements and gauge selection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If trial-and-error process is used to optimize lithography settings for different patterns, then manufacturing precision can be improved, but loss of time and increased costs occur
Solution Approach 1:
The patent applies preliminary action by pre-characterizing each lithography scanner's optical properties and storing them in a database before actual production use. This pre-characterization includes measuring and storing transmission cross-coefficient data that captures each scanner's unique optical proximity effects. When a scanner needs to image a pattern, the system retrieves the pre-stored characterization data and uses it to automatically determine optimal settings without requiring trial-and-error tuning, thus eliminating time loss while maintaining manufacturing precision.
Solution Approach 2:
The patent uses copying by creating a digital replica or model of each scanner's optical behavior through the stored characterization data. This digital copy contains all the necessary information about how the scanner responds to different patterns and settings. The system can then simulate and predict imaging outcomes using this digital copy, allowing optimal parameters to be determined computationally rather than through physical trial-and-error testing, thereby reducing time loss while preserving pattern imaging consistency.
2Manufacturing precision
If trial-and-error process is used to optimize lithography settings for different patterns, then manufacturing precision can be improved, but costs increase
Solution Approach 1:
The patent applies preliminary action by pre-characterizing each lithography scanner's optical properties and storing them in a database before actual production use. This pre-characterization includes measuring and storing transmission cross-coefficient data that captures each scanner's unique optical proximity effects. When a scanner needs to image a pattern, the system retrieves the pre-stored characterization data and uses it to automatically determine optimal settings without requiring trial-and-error tuning, thus eliminating time loss while maintaining manufacturing precision.
Solution Approach 2:
The patent uses copying by creating a digital replica or model of each scanner's optical behavior through the stored characterization data. This digital copy contains all the necessary information about how the scanner responds to different patterns and settings. The system can then simulate and predict imaging outcomes using this digital copy, allowing optimal parameters to be determined computationally rather than through physical trial-and-error testing, thereby reducing time loss while preserving pattern imaging consistency.
3Productivity
If generic model-based tuning is implemented, then productivity is improved by eliminating trial-and-error, but device complexity increases due to model requirements
Solution Approach 1:
The patent applies universality by developing a generic model-based tuning system that can handle multiple lithography scanners and various pattern types with a single unified approach. The system uses a standardized characterization process and database structure that works across different scanner models and manufacturers. The transmission cross-coefficient methodology provides a universal framework that captures the essential optical behavior of any scanner, allowing the same software platform and tuning algorithms to be applied universally, thereby improving productivity without proportionally increasing complexity.
Solution Approach 2:
The patent uses an intermediary approach by introducing a database as a mediator between the physical scanners and the control software. The database stores pre-characterized optical properties and serves as an intermediary layer that translates physical scanner characteristics into usable tuning parameters. This intermediary database simplifies the overall system architecture by separating the complex measurement and characterization processes from the actual tuning operations, making the system more manageable and easier to implement despite the underlying complexity of model-based tuning.
Data Source
AI summary
The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.