Lithography Shield Member Segmentation for Productivity
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Solution Overview
Problem
The existing methods for improving productivity in semiconductor device manufacturing using flip-chip mounting techniques, such as those involving light shield plates, are limited by restrictions in cable mounting and driving mechanism design, leading to decreased rotation range and productivity issues, especially when high-speed driving mechanisms are not employed.
Innovation Solution
A lithography apparatus with a shield member having a rotation mechanism and a translation mechanism, controlled by a controller to sequentially perform patterning using different edges of the shield member, allowing for efficient light shielding and improved productivity by optimizing the exposure order and reducing the need for high-speed driving mechanisms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a light shield plate is rotated and linearly driven to shield the peripheral portion of the wafer, then light shielding capability is improved, but the rotation range is limited by cable mounting and driving mechanism design, decreasing productivity
Solution Approach 1:
The light shield plate is divided into multiple arc-shaped shield regions, each capable of independently shielding specific peripheral portions of the wafer. The controller selectively activates different shield regions based on the shot region being processed, eliminating the need for large-scale rotation and achieving full peripheral coverage without expanding the rotation range.
Solution Approach 2:
The invention dynamically selects and activates different shield regions based on the current shot region position. The controller adjusts which shield regions are active during exposure, allowing flexible adaptation to different processing positions without requiring the entire light shield plate to rotate through large angles.
2Productivity
If the stage is driven at very high speed to improve productivity, then processing speed is improved, but the driving mechanism becomes more complex and expensive
Solution Approach 1:
Instead of using a single high-speed driving mechanism for the entire light shield plate, the system segments the shielding function into multiple regional components. Each shield region can be independently controlled, allowing standard-speed driving mechanisms to serve multiple functions through coordinated activation rather than requiring one complex high-speed mechanism.
Solution Approach 2:
The light shield plate design allows a single shield region to serve multiple purposes by being selectively activated for different shot regions. This multi-functionality reduces the need for specialized high-speed driving mechanisms, as the same mechanical structure can handle various shielding tasks through controller coordination.
3Object-affected harmful factors
If the rotation range of the light shield plate is increased to cover all peripheral shot regions, then light shielding coverage is improved, but the time required to move between shots increases
Solution Approach 1:
The peripheral shielding function is segmented into multiple discrete arc-shaped regions. The controller selects the appropriate shield region based on the current shot position, enabling rapid switching between regions without requiring continuous rotation. This segmentation allows the system to maintain full peripheral coverage while minimizing movement time through selective activation.
Solution Approach 2:
Multiple shield regions are pre-positioned and pre-configured on the light shield plate. The controller has advance knowledge of which shield region needs to be activated for each shot region, allowing for rapid selection and activation without time-consuming repositioning or rotation adjustments during the exposure process.
Data Source
AI summary
A lithography apparatus includes: a shield including a shield member having an aperture formed therein and having a first edge and a second edge defining the aperture; a driving mechanism including a rotation mechanism configured to rotate the shield member and a translation mechanism configured to translate the shield member; and a controller configured to control the driving mechanism so as to sequentially perform patterning.