Lithography Simulation Apparatus for Reticle Parameter Optimization
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Solution Overview
Problem
In lithography processes, especially during small lot production of custom LSIs, the frequent adjustment of parameters such as numerical aperture and coherence factor for each reticle replacement leads to a decrease in throughput due to the time-consuming recalibration required.
Innovation Solution
A simulation apparatus and method that calculates and optimizes parameter values for lithography systems by integrating multiple processing parts to evaluate pattern formation conditions and determine whether recalculations are necessary, allowing for efficient setting of parameters without the need for frequent recalibration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If parameter adjustment is performed every time a reticle is replaced to match optical proximity effect errors, then manufacturing precision is improved, but productivity deteriorates due to decreased throughput
Solution Approach 1:
The system performs preliminary measurement and characterization of optical proximity effect errors for each reticle before actual exposure. The error information is stored and used to automatically adjust parameters in advance, eliminating the need for time-consuming recalibration during production when switching between reticles.
Solution Approach 2:
The system creates a digital model or copy of the optical proximity effect characteristics for each reticle through initial measurement. This digital replica allows the system to simulate and predict pattern formation errors without physical recalibration, enabling rapid parameter adjustment when reticles are replaced.
2Manufacturing precision
If multiple parameters are adjusted and recalibrated for each reticle replacement, then pattern formation accuracy is improved, but loss of time increases due to frequent recalibration
Solution Approach 1:
The system creates a digital model or copy of the optical proximity effect characteristics for each reticle through initial measurement. This digital replica allows the system to simulate and predict pattern formation errors without physical recalibration, enabling rapid parameter adjustment when reticles are replaced.
Solution Approach 2:
The system replaces physical recalibration operations with computational simulations. By using optical simulation to predict pattern formation based on stored error data, the system eliminates the need for time-consuming mechanical adjustment and recalibration procedures.
3Manufacturing precision
If comprehensive parameter optimization is performed for each exposure, then manufacturing precision is improved, but device complexity increases due to multiple processing parts
Solution Approach 1:
The system merges multiple processing functions into an integrated simulation apparatus. The first processing part measures and characterizes reticle errors, the second processing part stores error data, and the third processing part performs simulations and parameter optimization, all combined in one system that works together to achieve comprehensive pattern formation control.
Solution Approach 2:
The system introduces an intermediary simulation layer between the physical reticle and the exposure process. The simulation apparatus acts as a mediator that processes reticle error data, predicts pattern formation outcomes, and determines optimal parameters before actual exposure, simplifying the overall control structure.
Data Source
AI summary
A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.