Lithography Substrate Transfer Apparatus With Segmented Fingers

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Solution Overview

Problem

The semiconductor industry faces challenges in maximizing wafer throughput while minimizing capital and operational costs, particularly in lithography systems where efficient substrate transfer is critical for maintaining high accuracy and reliability, especially in limited clean room space.

Innovation Solution

A substrate transfer apparatus with distinct sets of fingers for handling both unclamped and clamped substrates, allowing for secure transfer between different heights and locations within a lithography system, utilizing a robot arm with jointed sections for vertical and horizontal movement, and a load lock system for efficient transfer of clamped substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a single set of fingers is used to carry both unclamped and clamped substrates, then the device complexity is reduced, but the manufacturing precision and reliability of substrate transfer deteriorate due to the different shapes and weights of unclamped and clamped substrates

Engineering Contradiction:
Improvestructure complexityVSAvoidsubstrate transfer precision
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The finger assembly is segmented into a first set of fingers for carrying unclamped substrates and a second set of fingers for carrying clamped substrates. Each set is specifically designed with appropriate shape, size, and clamping force characteristics matched to its intended substrate type, thereby achieving precise and reliable transfer for both substrate configurations.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The apparatus employs movable or adjustable fingers that can change their configuration or engagement characteristics. The fingers are designed to adapt their shape or clamping force dynamically based on whether they are engaging an unclamped or clamped substrate, allowing a single apparatus to handle both types with optimal precision.

Inventive Principle:
Principle #15Dynamics

2Device complexity

If the fingers of the first set are positioned above the fingers of the second set, then the structure is simplified, but the fingers of the first set interfere with the substrate support structure when carrying clamped substrates

Engineering Contradiction:
Improvestructural arrangementVSAvoidsubstrate transfer operation
Core Design Contradiction:
Device complexityVSEase of operation

Solution Approach 1:

The finger sets are arranged in the vertical dimension rather than horizontal overlap. The first set of fingers is positioned below the second set, creating a vertical stacking arrangement that eliminates horizontal interference while maintaining both functional capabilities. This spatial reconfiguration in the vertical dimension resolves the interference problem.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Adaptability or versatility

If a robot arm with large movement range is used to transfer substrates between locations at different heights, then the adaptability is improved, but the device complexity and footprint increase

Engineering Contradiction:
Improvetransfer location adaptabilityVSAvoidequipment footprint
Core Design Contradiction:
Adaptability or versatilityVSArea of stationary object

Solution Approach 1:

The apparatus integrates multiple functional components in a nested or compact stacked arrangement. The body structure accommodates both sets of fingers in a space-efficient configuration, and the robot arm components are arranged to maximize movement range within a minimized footprint, allowing vertical and horizontal transfers without excessive space occupation.

Inventive Principle:
Principle #7Nested doll (Nesting)

Data Source

PatentUSRE48903E1Apparatus for transferring a substrate in a lithography system
Publication Date: 2022.01.25 ASML NETHERLANDS BV
  • USRE48903E1 patent drawing
  • USRE48903E1 patent drawing
  • USRE48903E1 patent drawing

AI summary

An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.