Lithography Vibration Isolation via Predictive Control
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Solution Overview
Problem
In lithography systems with a cluster configuration, the tradeoff between transfer speed and accuracy often results in vibration issues, which can degrade the precision of imprint technology, and existing vibration isolation methods either amplify noise or fail to effectively suppress low-frequency vibrations.
Innovation Solution
A lithography system with a control unit that centrally manages multiple imprint apparatuses, using transfer functions to predict and suppress vibrations across the system, employing a vibration isolation unit with a support mechanism and actuator to generate a vibration suppression force, and selectively deriving transfer functions based on apparatus information and drive signals to optimize vibration control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a high speed drive of a substrate stage is implemented to increase transfer speed, then productivity is improved, but vibration is generated that degrades manufacturing precision
Solution Approach 1:
The vibration isolation unit performs preliminary action by predicting vibration based on drive signals before the vibration occurs, and generates a counter-vibration signal in advance to cancel out the harmful vibration effects on the substrate stage
Solution Approach 2:
The control unit receives feedback from acceleration sensors that detect actual vibration, compares it with predicted vibration from drive signals, and adjusts the counter-vibration signal to optimize vibration cancellation and maintain transfer accuracy during high-speed operation
2Manufacturing precision
If a counter mass is installed to eliminate vibration, then manufacturing precision is improved, but device complexity and cost increase
Solution Approach 1:
The patent replaces the mechanical counter mass system with an active vibration isolation unit that uses sensors, controllers, and actuators to generate counter-vibration signals, substituting mechanical inertia-based vibration cancellation with an active control system
Solution Approach 2:
The vibration isolation unit dynamically changes operational parameters including the magnitude and phase of counter-vibration signals based on real-time drive signals and sensor feedback, allowing adaptive vibration cancellation without fixed mechanical structures
3Manufacturing precision
If a vibration isolation unit is installed to block vibration transmission, then manufacturing precision is improved, but noise amplification occurs in low frequency range
Solution Approach 1:
The control unit performs preliminary action by predicting vibration based on drive signals before the vibration occurs, allowing the system to prepare counter-vibration signals in advance rather than reacting to vibration after it occurs, which prevents noise amplification
Solution Approach 2:
The vibration isolation unit dynamically adjusts its operation based on real-time drive signals and sensor feedback, changing the characteristics of counter-vibration signals to match actual vibration conditions, preventing resonance and noise amplification that occur with static isolation systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively dampens vibration transmission between lithography apparatuses, enhancing transfer accuracy and speed while reducing noise and vibration-related errors, thereby improving the overall performance and cost-effectiveness of the lithography process.
Implementation Method 1
a vibration isolation unit configured to generate a vibration suppression force for suppressing vibration imparted to the object to be vibration-isolated
Data Source
AI summary
A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.


