Lithography Vibration Control via Signal Segmentation
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Solution Overview
Problem
In lithography apparatuses where multiple processing devices are mounted on a common base plate, vibrations from one device can degrade overlay precision and transfer precision of another device, making it difficult to control vibrations effectively using existing detection methods.
Innovation Solution
A lithography apparatus with a detector that estimates and separates vibration components from multiple sources, allowing the controller to accurately control actuators to reduce vibrations transferred between devices through the base plate, using feed-forward controllers to generate command values for actuators based on detected and estimated vibration signals.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a detector is provided to detect vibrations of the base plate between the processing device and the mechanism, then vibrations transferred from the mechanism to the processing device can be reduced, but the detector simultaneously detects vibrations generated by both the processing device and the mechanism, making it difficult to control vibrations by the actuator
Solution Approach 1:
The patent divides the vibration signal from the detector into multiple components corresponding to different vibration sources (processing device and mechanism). By segmenting the total vibration signal into source-specific components, the system can independently control actuators to reduce vibrations from each source without interference from the other.
Solution Approach 2:
The patent introduces an intermediary processing step that analyzes the detector output signal and separates it into vibration components from different sources. This intermediary component acts as a mediator between the detector and the actuator control system, enabling precise identification and control of vibrations from each source.
2Productivity
If multiple processing devices are mounted on a common base plate to improve productivity, then manufacturing efficiency increases, but vibrations from one device degrade overlay precision and transfer precision of another device
Solution Approach 1:
The patent employs a feedback control system where detectors monitor vibrations on the common base plate, and actuators apply counteracting forces to reduce these vibrations. The control unit continuously adjusts the actuator commands based on real-time vibration measurements, ensuring that precision is maintained even with multiple devices operating simultaneously on the same base plate.
Data Source
AI summary
The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.