Lxicoherent System Decomposition for Lithography Mask Compensation
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Solution Overview
Problem
Current optical lithography methods, particularly those using Optimal Coherent Systems (OCS), face inefficiencies in calculating dimensional compensation for integrated circuit patterns due to the computational intensity required for high accuracy, leading to long processing times and compromised accuracy at full chip scale.
Innovation Solution
The implementation of loxicoherent systems, which decompose the Transmission Cross Coefficient (TCC) using a pair of coherent and incoherent systems, allowing for faster calculation by isolating residual TCC components and decomposing them into lower-dimensioned kernels, thereby reducing the number of coherent systems needed for accurate dimensional compensation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If Optimal Coherent Systems (OCS) methods are used to calculate dimensional compensation for integrated circuit patterns, then manufacturing precision is improved, but processing time increases significantly
Solution Approach 1:
The patent segments the Transmission Cross Coefficient (TCC) into multiple components that can be processed separately. By dividing the TCC calculation into manageable segments, the computational complexity is reduced while maintaining accuracy, thus decreasing processing time without sacrificing dimensional compensation precision
Solution Approach 2:
The patent changes the computational parameters by using approximate methods to calculate the TCC components. Instead of using computationally intensive exact methods, the patent employs parameter approximations that significantly reduce calculation time while maintaining sufficient accuracy for dimensional compensation at full chip scale
2Manufacturing precision
If the number of coherent systems is increased to improve image calculation accuracy, then manufacturing precision improves, but device complexity and processing time worsen
Solution Approach 1:
The patent applies partial action by calculating only the necessary components of the TCC with sufficient accuracy rather than computing all components exhaustively. This approach provides adequate image calculation accuracy for dimensional compensation without requiring the full computational resources that would increase device complexity
Solution Approach 2:
The patent modifies the computational parameters by using approximate TCC calculations instead of exact calculations. This parameter change reduces the number of coherent systems needed while maintaining the accuracy required for proper dimensional compensation
Data Source
AI summary
Disclosed are mask definition tools, apparatus, methods, systems and computer program products configured to process data representing a semiconductor fabrication mask. A non-limiting example of a method includes performing a decomposition process on a full Transmission Cross Coefficient (TCC) using coherent optimal coherent systems (OCS) kernels; isolating a residual TCC that remains after some number of coherent kernels are extracted from the full TCC; and performing at least one decomposition process on the residual TCC using at least one loxicoherent system. The loxicoherent system uses a plurality of distinct non-coherent kernel functions and is a compound system containing a paired coherent system and an incoherent system that act in sequence. An output of the coherent system is input as a self-luminous quantity to the incoherent system, and the output of the incoherent system is an output of the loxicoherent system.