Load Lock Cooling With Non-Contact Temperature Sensing for Substrates

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Solution Overview

Problem

In substrate processing apparatuses, substrates are often unloaded from the load lock chamber to an atmospheric pressure region without being cooled to a desired temperature, leading to potential oxidation and damage to semiconductor devices.

Innovation Solution

A load lock chamber equipped with a substrate support and a non-contact temperature sensor to measure the temperature of the substrate support, allowing for precise temperature control before unloading, using a boat with high thermal conductivity materials and inert gas cooling to ensure substrates are cooled to a safe temperature before transfer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If substrates are unloaded from the load lock chamber without cooling, then the unloading process is faster, but the substrates may oxidize or be damaged due to high temperature exposure to atmospheric pressure

Engineering Contradiction:
Improveunloading speedVSAvoidsubstrate integrity
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The substrate is cooled in the load lock chamber before being unloaded to the atmospheric pressure region. This preliminary cooling action prevents oxidation and damage by ensuring the substrate reaches a safe temperature before exposure to atmospheric conditions, thus maintaining substrate integrity while enabling efficient unloading operations.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If a contact temperature sensor is used to measure substrate temperature, then measurement accuracy is improved, but the sensor may contaminate or damage the substrate

Engineering Contradiction:
Improvetemperature measurement accuracyVSAvoidsubstrate contamination
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

A non-contact temperature sensor is used to measure the substrate temperature through the chamber wall or window. This intermediary measurement method allows accurate temperature monitoring without direct contact between the sensor and substrate, thereby avoiding contamination or damage to the substrate while maintaining measurement precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Temperature

If the load lock chamber is equipped with cooling facilities and temperature sensors, then substrate temperature control is improved, but the device complexity increases

Engineering Contradiction:
Improvesubstrate temperature controlVSAvoidchamber system complexity
Core Design Contradiction:
TemperatureVSDevice complexity

Solution Approach 1:

The load lock chamber is equipped with cooling facilities and temperature sensors that serve multiple functions: cooling the substrate before unloading, monitoring temperature during the process, and preventing oxidation. This multi-functional approach improves substrate temperature control while minimizing the increase in device complexity by combining several functions into a single integrated system.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Accurate temperature measurement and control prevent substrate oxidation and damage, ensuring reliable semiconductor device manufacturing by ensuring substrates are cooled to a safe temperature before exposure to atmospheric pressure.

Implementation Method 1

a temperature sensor capable of measuring a temperature of the substrate support in a non-contact manner

Methodology Applied
Scientific EffectThermal radiation: Thermal Radiation

Data Source

PatentUS20230386871A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
Publication Date: 2023.11.30 KOKUSAI DENKI KK
  • US20230386871A1 patent drawing
  • US20230386871A1 patent drawing
  • US20230386871A1 patent drawing

AI summary

According to one embodiment of the present disclosure, there is provided a technique that includes: a load lock chamber into which a substrate is loaded and from which the substrate is unloaded; a substrate support provided in the load lock chamber and configured to support a plurality of substrates comprising the substrate in a multistage manner with a predetermined interval therebetween; and a temperature sensor capable of measuring a temperature of the substrate support in a non-contact manner while the plurality of substrates are supported by the substrate support.