Load Lock Substrate Checking With Dual-Region Sensor Layout
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Solution Overview
Problem
Existing substrate processing apparatuses with load lock chambers require structural modifications to check substrates from the lowermost to the uppermost slot using a single sensor, limiting flexibility and efficiency in abnormality determination.
Innovation Solution
A load lock chamber design with sensors on the outer peripheral upper and lower regions and a controller that performs abnormality determination based on data from these sensors and threshold values, allowing for independent checking of substrates without altering the chamber structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a single sensor is used to check substrates from lowermost to uppermost slot, then the number of sensors is reduced, but the load lock chamber structure must be changed (height increased)
Solution Approach 1:
The patent divides the substrate checking function into multiple sensors positioned at different heights (upper region and lower region). Each sensor checks substrates in its specific region, segmenting the checking task spatially. This eliminates the need to increase chamber height while still enabling comprehensive substrate monitoring across all slots.
2Reliability
If multiple sensors are positioned to check all substrate slots, then complete substrate monitoring is achieved, but the device complexity increases
Solution Approach 1:
The patent positions sensors in specific locations (upper region and lower region outer peripheral portions) where they can effectively monitor substrates in their respective regions. Each sensor has a defined local checking responsibility, avoiding the need for complex sensor arrangements while ensuring complete coverage of all substrate slots through strategic local positioning.
3Reliability
If the load lock chamber structure is modified to accommodate substrate checking, then substrate monitoring capability is improved, but the manufacturing cost and time increase
Solution Approach 1:
The patent segments the substrate checking function across multiple sensors positioned at different heights rather than requiring a single tall chamber or complex mechanical scanning system. This allows the load lock chamber to maintain its original compact structure while achieving comprehensive substrate monitoring through distributed sensor placement, thereby avoiding manufacturing modifications and associated costs.
Data Source
AI summary
A technique capable of performing an abnormality determination on each substrate transferred to a load lock chamber with less dependence a structure of the load lock chamber is described. A substrate processing apparatus includes: a substrate support provided in the load lock chamber and capable of supporting a plurality of substrates in a multistage manner at predetermined intervals; an elevator capable of elevating and lowering the substrate support; a plurality of sensors respectively provided on outer peripheral portions of the upper region and the lower region in the load lock chamber and configured to check a state of the substrate supported by the substrate support; and a controller including an abnormality determinator and configured to be capable of controlling the abnormality determinator configured to perform an abnormality determination on the substrate based on data respectively sent from the plurality of sensors and a predetermined threshold value.