Load Lock Chamber Layout for Combined Wafer Alignment and Vision Inspection
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Solution Overview
Problem
The existing substrate treatment processes involve complex transfer sequences and increased time requirements for notch alignment, vision inspection, and substrate status checks, leading to decreased Unit Production Per Hour (UPEH) efficiency due to the need for separate alignment and inspection units in the load lock chamber.
Innovation Solution
A substrate treating apparatus with a load lock chamber that incorporates a rotating body for both alignment and vision inspection, utilizing dual rotational supporters and stationary supporters, along with alignment and vision units, to perform inspections during chamber pumping and purge times, reducing transfer complexity and time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If separate alignment unit and inspection unit are installed in load lock chamber, then alignment inspection and vision inspection can be performed, but structural complexity of load lock chamber increases
Solution Approach 1:
The patent combines the alignment inspection unit and vision inspection unit into a single integrated inspection unit. This unified structure performs both alignment inspection (checking substrate position and orientation) and vision inspection (examining substrate surface quality) functions, thereby reducing the structural complexity of the load lock chamber while maintaining full inspection capabilities.
Solution Approach 2:
The inspection unit is designed with multi-functionality to perform both alignment inspection and vision inspection tasks. By making the inspection unit universal, the patent eliminates the need for separate dedicated units, thus reducing structural complexity while preserving adaptability for multiple inspection purposes.
2Ease of operation
If substrates are transferred one by one with fixed movement path, then transfer process is simple, but Unit Production Per Hour (UPEH) decreases
Solution Approach 1:
The patent introduces a rotating body that can dynamically adjust the substrate transfer path. Instead of fixed sequential transfer, the rotating body enables multiple substrates to be transferred in parallel or in optimized sequences, dynamically adapting the transfer process to maximize throughput while maintaining operational simplicity through automated control.
Solution Approach 2:
The patent adds rotational movement as a new dimension to the substrate transfer process. By incorporating a rotating body, the system transitions from linear one-by-one transfer to multi-dimensional transfer capabilities, allowing substrates to be moved simultaneously along different paths, thereby increasing UPEH without significantly complicating the transfer mechanism.
3Measurement precision
If alignment and vision inspection are performed in separate chambers, then inspection accuracy is maintained, but transfer sequence becomes complex and time increases
Solution Approach 1:
The patent merges alignment inspection and vision inspection into a single integrated inspection unit within the load lock chamber. This combination allows both types of inspection to be performed simultaneously or in seamless sequence on the same substrate without requiring transfer to separate chambers, thereby reducing total inspection time while maintaining the accuracy requirements for both inspection types through the unified design.
Data Source
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AI summary
Provided is an apparatus for treating a substrate, the apparatus including: an equipment front end module including a first transfer robot for transferring a substrate; a transfer chamber including a second transfer robot for transferring a substrate; and a load lock chamber disposed on a transfer path along which a substrate is transferred between the transfer frame and the transfer chamber, in which the load lock chamber includes: a housing including an upper chamber having an upper space, and a lower chamber positioned below the upper chamber and having a lower space; a first rotational supporter for supporting and rotating a substrate located in the upper space; and a second rotational supporter for supporting and rotating a substrate located in the lower space, and the first rotational supporter and the second rotational supporter are used for both an alignment inspection of a substrate and a vision inspection of a substrate.