Load Port Latch Mechanism Pressure Control
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Solution Overview
Problem
The existing load port systems in wafer storage containers generate dust during the opening and closing of lids, which contaminates the wafers due to air pressure differences between the wafer carrying chamber and the clean room, leading to particle adhesion on the wafers.
Innovation Solution
A load port system is designed with a latch driving mechanism storage section that maintains an air pressure equal to or lower than the clean room pressure, using an exhaust device to reduce air pressure and prevent dust from entering the wafer storage container, and incorporating airtight seals to minimize air inflow, along with an inner cap and hollow shaft section to enhance sealability and reduce contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the latch driving mechanism storage section is isolated from the clean room, then the latch driving mechanism can be installed and operated, but dust is generated and enters the wafer storage container due to air pressure differences
Solution Approach 1:
The load port is divided into three distinct air pressure zones: the clean room (higher pressure), the latch driving mechanism storage section (lower pressure), and the wafer storage container (higher pressure). This segmentation allows the latch driving mechanism to be isolated from the clean room environment, preventing dust generation and contamination while maintaining operational functionality.
Solution Approach 2:
The lid of the wafer storage container serves as an intermediary element that passes through the latch driving mechanism storage section. By positioning the lid passing section within the low-pressure zone and ensuring proper sealing, the system allows the lid to be operated by the latch mechanism while preventing dust from the storage section from contaminating the wafers in the container.
2Object-affected harmful factors
If the air pressure in the latch driving mechanism storage section is lower than the clean room, then dust is prevented from entering the wafer storage container, but air leakage occurs at the lid passing section
Solution Approach 1:
A seal member (such as an O-ring) is installed at the lid passing section to ensure airtightness. This simple, replaceable sealing component effectively prevents air leakage between the low-pressure latch driving mechanism storage section and the higher-pressure wafer storage container, maintaining the pressure differential without requiring complex sealing structures.
3Ease of operation
If the lid is sucked and held by the sucking tool, then the lid can be opened and closed, but dust is generated from the latch driving mechanism during the operation
Solution Approach 1:
The latch driving mechanism is extracted from the clean room environment and placed in a separate, isolated latch driving mechanism storage section with lower air pressure. This extraction prevents the dust generated during latch operation (when opening/closing the lid) from contaminating the clean room and wafer storage container, while the sucking tool continues to hold and operate the lid normally through the isolated boundary.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces the amount of particles adhering to wafers during transfer by minimizing air currents and dust generation, maintaining cleanliness within the wafer carrying chamber and storage container.
Implementation Method 1
a sucking tool which is installed in the door section, and capable of holding the lid by sucking the lid
Implementation Method 2
an exhaust device to reduce air pressure and prevent dust from entering the wafer storage container
Data Source
Figure 1
Figure 2~3
Figure 4~5
AI summary
The present invention provides a load port including: a tabular portion which constitutes a part of a wall surface of a wafer carrying chamber and has an opening through which the wafer carrying chamber is opened; a mounting table on which a wafer storage container is mounted; a door section which can open and close the opening; a sucking tool which can suck and hold a lid; a latch which can fix and unfix a container main body and the lid; and a latch driving mechanism storage section which stores a latch driving mechanism therein, the load port being configured to enable setting an air pressure in the latch driving mechanism storage section to be equal to the air pressure in a clean room or lower than the air pressure in the clean room. Consequently, it is possible to provide the load port and a method for carrying wafers which can prevent dust, which has been produced from the load port, movable portions in the lid of the wafer storage container, and others at the time of taking in and out the wafers to and from the wafer storage container, from adhering to the wafers.