Local Feature Dimension Analysis for Mask Rule Check Violations

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Solution Overview

Problem

Conventional mask rule check (MRC) violation detection processes fail to quantify the extent of violations and do not detect violations based on maximum feature sizes, leading to undesirable outcomes in semiconductor manufacturing.

Innovation Solution

Implementing two-dimensional geometrical detectors that vary in size until contact with mask feature edges to determine local feature dimensions, enabling detection of both minimum and maximum MRC violations and adjusting mask designs to minimize these violations using cost functions and gradients.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional MRC violation detection processes are used, then the detection process is simple, but the extent of violations cannot be quantified and maximum feature size violations are not detected

Engineering Contradiction:
Improveviolation quantificationVSAvoiddetection process complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The detection process is segmented into multiple stages: initial MRC check, identification of candidate features, calculation of local feature dimensions (LFD) for candidates, and determination of actual violations. This segmentation allows progressive refinement from simple to complex analysis only where needed.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies partial action by performing detailed LFD calculations only on candidate features identified in the initial MRC check, rather than analyzing all features comprehensively. This reduces overall computational complexity while still achieving accurate violation quantification where necessary.

Inventive Principle:
Principle #16Partial or excessive action

2Adaptability or versatility

If two-dimensional geometrical detectors varying in size are used to determine local feature dimensions, then both minimum and maximum MRC violations can be detected, but the computational complexity increases

Engineering Contradiction:
Improvedetection capabilityVSAvoidcomputation complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The detector size is made dynamic rather than fixed. The patent varies the detector size to find the maximum inscribed circle at each candidate feature location, enabling detection of both minimum and maximum feature size violations. This dynamic adaptation allows a single detection mechanism to handle multiple violation types.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent performs preliminary MRC checks to identify candidate features before conducting detailed LFD calculations. This preliminary filtering action reduces the number of features requiring complex analysis, thereby reducing overall computational complexity while maintaining detection versatility.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If mask designs are adjusted using cost functions and gradients to minimize violations, then manufacturing precision improves, but the design process becomes more complex

Engineering Contradiction:
Improvemask design precisionVSAvoiddesign process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements feedback by calculating LFDs for mask features, comparing them against MRC specifications to identify violations, and then using this information to adjust the mask design. The cost function provides quantitative feedback on violation severity, guiding iterative improvements to achieve compliance.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent adjusts mask design parameters (feature sizes, shapes, positions) based on LFD calculation results and cost function gradients. By changing these parameters iteratively, the design converges toward compliance with MRC specifications while minimizing violations.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20250284190A1Determining mask rule check violations and mask design based on local feature dimension
Publication Date: 2025.09.11 ASML NETHERLANDS BV
  • US20250284190A1 patent drawing
  • US20250284190A1 patent drawing
  • US20250284190A1 patent drawing

AI summary

Methods and systems for determining mask rule check (MRC) violations associated with mask features based on a local feature dimension (LFD) of mask features. A detector is placed at a first location of a mask feature and its size is varied until it is in contact with a second location of the mask feature. The size of the detector when it is in contact with the second location is determined as an LFD of a portion of the mask feature. For example, the LFD may be determined as a function of a radius of a circular detector. An MRC violation may be detected by comparing the LFD with an LFD specification in the MRC. For example, an MRC violation may be detected when the LFD of the portion is lesser than a minimum LFD or greater than a maximum LFD specified in the MRC.