Lookup Table for Electron Beam Lithography Data Reduction
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Solution Overview
Problem
Existing electron beam lithography systems face challenges with large data sizes, leading to longer data transfer times and increased processing costs due to the need to process and transfer data sets for every unit pattern, even when patterns are repetitive.
Innovation Solution
The method involves dividing a design layout into units and creating a lookup table that maps repeating units to a single data set, reducing data size by including each repeating pattern unit only once, and using this reduced data representation along with the lookup table to expose an energy-sensitive layer with a charged particle beam.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of information
If data sets for every unit pattern are processed and transferred in existing electron beam lithography systems, then complete pattern data is available for exposure, but data size becomes large, leading to longer data transfer times and increased processing costs
Solution Approach 1:
The patent creates a lookup table that stores references to pattern data instead of the actual pattern data itself. The lookup table contains entries that map pattern identifiers to their corresponding data set locations. During exposure, the system retrieves pattern data using these lookup table references, significantly reducing the amount of data that needs to be transferred and processed while still having access to complete pattern information when needed.
2Loss of information
If data sets for every unit pattern are processed and transferred in existing electron beam lithography systems, then complete pattern data is available for exposure, but processing costs increase due to redundant data handling
Solution Approach 1:
The patent merges multiple identical or similar pattern data sets into a single shared data set. The lookup table contains references that point to this shared data set, allowing multiple pattern units to utilize the same data. This consolidation eliminates redundant data storage and processing, reducing manufacturing costs while maintaining the ability to expose complete patterns through the reference system.
3Loss of information
If all pattern portions are included in the data representation, then complete design layout information is preserved, but data size increases requiring more storage and transfer resources
Solution Approach 1:
The patent implements a lookup table that stores compact references to pattern data instead of the full pattern data itself. Each entry in the lookup table contains a pattern identifier and a reference to the data set location, consuming minimal storage space. The complete design layout information is preserved by maintaining the original pattern data sets, which are accessed through the compact lookup table references during exposure operations.
Solution Approach 2:
The patent segments the design layout data into distinct pattern units, each with its own data set. The lookup table organizes these segmented pattern units with their corresponding data set references. This segmentation allows the system to manage large design layouts by breaking them into smaller, independently referenceable units, reducing the amount of data that needs to be handled at any one time while preserving complete information through the reference structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces data storage and transfer requirements, processing time, and costs by eliminating redundant data sets, making high-volume manufacturing more efficient.
Implementation Method 1
electron beam (e-beam) lithography uses a focused beam of electrons to expose the resist material
Implementation Method 2
exposing desired areas of the resist material or material layer on the substrate with a focused beam of an appropriate energy and dosage
Data Source
AI summary
The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table.