Low-e material comprising a thick layer based on silicon oxide
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Solution Overview
Problem
Silver-based functional metal layers in glazed units used for heating and cooling devices suffer from chemical and thermal instability, leading to defects such as corrosion, scratches, and dewetting, which degrade their optical and energy performance, especially under high-temperature and humid conditions.
Innovation Solution
Incorporating a silicon oxide layer with a thickness greater than 12 nm between the glass substrate and the first dielectric layer of the stack, which enhances chemical durability and resistance to heat treatment without affecting optical neutrality, thereby delaying degradation and maintaining emissivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a silver-based functional metal layer is used in glazed units, then the electrical conduction and infrared radiation reflection properties are improved, but the chemical and thermal resistance deteriorates under high-temperature and humid conditions
Solution Approach 1:
A silicon oxide layer with thickness greater than 12 nm is introduced as an intermediary barrier between the glass substrate and the silver-based functional metal layer. This intermediate layer protects the silver layer from chemical attacks and thermal degradation while maintaining the electrical conduction and infrared radiation reflection properties of the silver layer.
Solution Approach 2:
The patent creates a composite structure combining glass substrate, silicon oxide layer, and silver-based functional metal layer. This composite material system leverages the chemical stability of glass, the protective properties of silicon oxide, and the functional properties of silver to achieve both reliability and stability under extreme conditions.
2Ease of manufacture
If the silver layer is exposed to high-temperature heat treatment, then the manufacturing process is simplified, but the mechanical strength and optical quality deteriorate due to dewetting and corrosion
Solution Approach 1:
The silicon oxide layer is deposited beforehand to create a protective barrier before the silver layer is exposed to high-temperature heat treatment. This preliminary protective action prevents dewetting and corrosion during subsequent manufacturing processes, allowing heat treatment to proceed without compromising mechanical strength or optical quality.
3Illumination intensity
If a thin silicon oxide layer is used, then the optical neutrality is maintained, but the protection against heat treatment and chemical attacks is insufficient
Solution Approach 1:
The patent optimizes the thickness parameter of the silicon oxide layer to be greater than 12 nm. This specific thickness range provides sufficient chemical and thermal protection while maintaining optical neutrality. The parameter optimization balances protective functionality with optical performance requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The silicon oxide layer significantly increases the resistance to heat treatment, allowing the material to withstand higher temperatures for longer periods without haze or emissivity degradation, ensuring robustness through tempering and bending processes, and maintaining the material's performance and durability.
Implementation Method 1
The silicon oxide layer significantly increases the resistance to heat treatment, allowing the material to withstand higher temperatures for longer periods without haze or emissivity degradation
Implementation Method 2
silver-based functional metal layers (or silver layers) have advantageous properties of electrical conduction and of reflection of infrared radiation (IR)
Data Source
AI summary
A material includes a transparent substrate coated with a stack including at least one functional metal layer based on silver and at least two dielectric coatings, each dielectric coating including at least one dielectric layer, in such a way that each functional metal layer is positioned between two dielectric coatings, wherein the stack includes a layer based on silicon oxide having a thickness of greater than or equal to 12 nm located directly in contact with the substrate.

