Radiation-Sensitive Resist Composition for Low-Fluorine Patterning
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Solution Overview
Problem
Existing radiation-sensitive compositions with reduced fluorine atom content face challenges in maintaining sensitivity, line width roughness (LWR) performance, critical dimension uniformity (CDU), and storage stability during pattern formation.
Innovation Solution
A radiation-sensitive composition comprising an onium salt compound with a specific structure that generates acid through hydrogen bonding, stabilizing the sulfonate anion, thereby enhancing sensitivity, LWR, and CDU performance while maintaining good storage stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If perfluoroalkylsulfonic acid is used as a photoacid generator to improve sensitivity and resolution, then sensitivity and resolution are improved, but fluorine atom content increases which raises environmental concerns
Solution Approach 1:
The patent changes the chemical structure parameters of the photoacid generator by replacing perfluoroalkyl groups with non-fluorinated cyclic structures (3-40 ring members) while maintaining the sulfonic acid functionality. This structural parameter change reduces fluorine content to meet environmental requirements while preserving the strong acidity needed for high sensitivity and resolution in photolithography
Solution Approach 2:
The patent creates a composite photoacid generator structure combining a non-fluorinated cyclic hydrocarbon framework with a sulfonic acid group. This composite structure integrates the stability and strength provided by the cyclic structure with the acidic functionality required for photoacid generation, achieving both environmental compliance and high performance
2Object-affected harmful factors
If fluorine atom content is reduced in the photoacid generator, then environmental compatibility is improved, but sensitivity, LWR performance, and storage stability deteriorate
Solution Approach 1:
The patent modifies the molecular parameters by introducing cyclic structures with 3-40 ring members that provide structural rigidity and stability. These cyclic frameworks replace flexible perfluoroalkyl chains, reducing fluorine content while enhancing storage stability through the inherent stability of cyclic structures and maintaining sensitivity through preserved sulfonic acid functionality
3Productivity
If perfluoroalkylsulfonic acid is used to enhance sensitivity, then sensitivity is improved, but line width roughness (LWR) and critical dimension uniformity (CDU) performance deteriorate
Solution Approach 1:
The patent optimizes structural parameters by using cyclic structures with controlled ring sizes (3-40 members) that regulate acid generation kinetics. The cyclic framework provides a balanced acid strength that achieves high sensitivity while maintaining uniform acid distribution, thereby improving LWR and CDU performance compared to perfluoroalkylsulfonic acids
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high-quality resist patterns with excellent sensitivity, LWR performance, and CDU, along with improved storage stability, ensuring a high yield in pattern formation.
Implementation Method 1
generates acid through hydrogen bonding, stabilizing the sulfonate anion
Implementation Method 2
generating an acid by irradiating the coating of the resist composition with a radioactive ray
Data Source
AI summary
A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit (I) which includes an acid-dissociable group; and a solvent. W is a cyclic structure having 3 to 40 ring members formed together with the two carbon atoms; a formula between the two carbon atoms below represents a single bond or a double bond, , A is one of groups represented by formulae (A-1) to (A-7); R1 is a monovalent organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a carboxy group, a hydroxy group, an amino group, a halogen atom, or a thiol group, when there are a plurality of R1s, the plurality of R1s are same as or different from each other; m1 is an integer of 0 to 4; and Z+ is a monovalent radiation-sensitive onium cation.