Low-LWR Resist Composition With Dual Acid Diffusion Control
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Solution Overview
Problem
Existing resist compositions suffer from high line width roughness (LWR) in pattern formation, which affects the quality and precision of the resulting resist patterns.
Innovation Solution
An actinic ray-sensitive or radiation-sensitive resin composition containing a resin whose polarity is increased by acid action, combined with photoacid generators and acid diffusion control agents, including a first and second acid diffusion control agent with specific acid dissociation constants and C log P values, to control acid diffusion and enhance dissolution contrast.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional photoacid generator is used in the resist composition, then the basic pattern formation function is achieved, but the line width roughness (LWR) of the resist pattern becomes high
Solution Approach 1:
The patent introduces an acid diffusion control agent as an intermediary substance between the photoacid generator and the resin. This agent has specific acid dissociation constant and C log P value ranges that allow it to control acid diffusion precisely, thereby reducing LWR while maintaining reliable pattern formation. The intermediary substance mediates the acid diffusion process to achieve the desired pattern quality.
Solution Approach 2:
The patent applies parameter changes by specifying precise ranges for the acid dissociation constant and C log P value of the acid diffusion control agent. By controlling these chemical parameters within specific ranges, the invention optimizes acid diffusion behavior to reduce LWR while ensuring reliable pattern formation, thus resolving the contradiction between precision and reliability.
2Manufacturing precision
If acid diffusion is not controlled, then the photoacid generator can effectively catalyze resin dissolution, but unwanted acid diffusion occurs reducing pattern precision
Solution Approach 1:
The patent uses parameter changes by defining specific ranges for the acid dissociation constant and C log P value of the acid diffusion control agent. These parameter controls enable the agent to restrict acid diffusion to desired levels while preserving sufficient catalytic activity for resin dissolution, thus achieving both high pattern precision and maintained dissolution efficiency.
Solution Approach 2:
The acid diffusion control agent acts as an intermediary that modulates acid diffusion. It allows controlled acid movement to reach the resin for catalysis while preventing excessive diffusion that would compromise pattern precision. This intermediary function balances pattern precision requirements with dissolution efficiency needs.
3Manufacturing precision
If the resist composition uses simple acid diffusion control, then the formulation remains simple, but line width roughness cannot be sufficiently reduced
Solution Approach 1:
The patent achieves sophisticated LWR control through parameter changes in the acid diffusion control agent's acid dissociation constant and C log P value, rather than through complex multi-component formulations. This approach reduces LWR effectively while keeping the resist composition relatively simple by focusing on optimizing key chemical parameters of a single controlling agent.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves low line width roughness (LWR) in resist patterns, improving pattern formation precision and quality by effectively quenching unwanted acid diffusion and enhancing solubility differences between exposed and unexposed areas.
Implementation Method 1
the photoacid generator is composed of a cation and an anion and generates an acid upon irradiation with an actinic ray or radiation
Implementation Method 2
a first acid diffusion control agent composed of a first cation and a first anion... and a second acid diffusion control agent composed of a second cation and a second anion... effectively quenching unwanted acid diffusion
Data Source
AI summary
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can form a resist pattern with a low LWR. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin whose polarity is increased by the action of an acid, one or more photoacid generators composed of a cation and an anion and generating an acid upon irradiation with an actinic ray or radiation, a first acid diffusion control agent composed of a first cation and a first anion, and a second acid diffusion control agent composed of a second cation and a second anion, wherein an acidic compound produced by replacing the cation in the photoacid generator with a proton has an acid dissociation constant A of −1.50 or less, an acidic compound produced by replacing the first cation of the first acid diffusion control agent with a proton has an acid dissociation constant B of more than −1.50, and an acidic compound produced by replacing the second cation of the second acid diffusion control agent with a proton has an acid dissociation constant C of more than −1.50, the first cation has a C log P value in the range of 5.400 to 6.000, and the second cation has a C log P value of 8.000 or more.