Low-Oxygen Carbon Electrode Coating for Long-Term Activity Retention
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Solution Overview
Problem
Existing electrode production methods limit the durability of electrodes, particularly in maintaining performance over long periods of storage.
Innovation Solution
The electrode comprises a substrate film, a metal underlying layer, and a conductive carbon layer, with a specific oxygen-to-carbon ratio measured using X-ray photoelectron spectroscopy, and is produced using a method that includes sputtering under low water partial pressure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional sputtering method is used to dispose conductive carbon layer on substrate, then electrode can be produced, but the electrode activity deteriorates after long-term storage
Solution Approach 1:
The patent applies parameter changes by controlling the water partial pressure during sputtering to 1.40×10^-4 Pa or less, and by optimizing the oxygen-to-carbon ratio to 0.01 or less at 4.5 nm depth. These parameter optimizations prevent excessive oxygen incorporation in the carbon layer, thereby maintaining electrode activity durability after long-term storage.
Solution Approach 2:
The patent creates an inert environment by performing sputtering under ultra-low water partial pressure conditions (1.40×10^-4 Pa or less). This inert atmosphere prevents water and oxygen from contaminating the carbon layer during deposition, ensuring the layer maintains its electrochemical activity over extended storage periods.
2Manufacturing precision
If sputtering is performed under normal atmosphere, then conductive carbon layer can be deposited, but oxygen content increases reducing electrode performance
Solution Approach 1:
The patent performs sputtering in an inert atmosphere with water partial pressure controlled to 1.40×10^-4 Pa or less. This prevents oxygen and water vapor from contaminating the carbon layer during deposition, achieving precise control of the oxygen-to-carbon ratio at 0.01 or less.
Solution Approach 2:
The patent replaces conventional atmospheric deposition with vacuum-based sputtering under controlled low water partial pressure. This substitution allows precise control of the chemical composition by eliminating atmospheric oxygen interference during the deposition process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the durability of electrode activity, reducing performance degradation even after long-term storage, and maintains excellent activity on ferricyan.
Implementation Method 1
a third step of carrying out sputtering under an atmosphere under which a partial pressure of water is 1.40×10−4 Pa or less to dispose the conductive carbon layer on a one-side surface of the metal underlying layer
Implementation Method 2
the ratio (O/C) of oxygen to carbon is measured using X-ray photoelectron spectroscopy
Data Source
AI summary
An electrode includes a substrate film, a metal underlying layer, and a conductive carbon layer. A ratio (O/C) of oxygen to carbon at a place 4.5 nm away from a one-side surface of the conductive carbon layer toward the other side in the thickness direction is less than 0.01 where the ratio (O/C) of oxygen to carbon is measured using X-ray photoelectron spectroscopy.