Low-Tg Multi-Tether Diblock Copolymers for Faster Defect-Free DSA
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional lithographic techniques face limitations in achieving further reduction of feature dimensions due to aberrations, focus, proximity effects, and minimum achievable exposure wavelengths, necessitating new block copolymers with enhanced kinetic properties for defect-free assembly and reduced annealing requirements in directed self-assembly processes.
Innovation Solution
Development of low Tg multi-tethered diblock copolymers synthesized through living anionic polymerization, incorporating oligo-flexible tethered groups or additional low Tg block segments, to enhance kinetic mobility and reduce defects in self-assembly processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional lithographic techniques are used to reduce feature dimensions, then resolution is improved, but aberrations, focus issues, and proximity effects worsen
Solution Approach 1:
The patent introduces block copolymers as an intermediary self-assembly layer that mediates between the lithographic pattern and the final high-resolution feature. The BCP forms nanoscale domains through spontaneous phase separation, acting as a mediator that translates larger lithographic patterns into finer features while avoiding the aberration and proximity effects that plague direct lithographic approaches
Solution Approach 2:
The patent changes the physical-chemical parameters of the polymer system by using block copolymers with specific glass transition temperatures (Tg). By selecting BCPs with appropriate Tg values and incorporating flexible tethered groups, the system enables self-assembly at reduced thermal energy inputs, improving reliability while achieving high resolution through controlled phase separation behavior
2Reliability
If high thermal energy and long annealing time are used for block copolymer self-assembly, then assembly completeness is improved, but processing time and energy consumption worsen
Solution Approach 1:
The patent modifies the thermal parameters of the block copolymer system by incorporating flexible tethered groups and selecting specific BCP compositions with optimized Tg values. These parameter changes enable the system to achieve complete self-assembly at lower temperatures and shorter times, reducing the annealing process from potentially hours to minutes while maintaining defect-free assembly quality
Solution Approach 2:
The patent introduces dynamic flexibility into the polymer chains through tethered oligo groups that can rotate and adapt during the self-assembly process. This dynamic behavior allows the chains to more easily find their equilibrium configurations, accelerating the self-assembly kinetics and reducing the time required to achieve defect-free patterns without compromising assembly completeness
3Quantity of substance
If block copolymer molecular weight is increased to improve pattern multiplication, then feature density is improved, but kinetic mobility and assembly speed worsen
Solution Approach 1:
The patent segments the polymer structure by incorporating flexible tethered groups that divide the rigid block copolymer chains into more mobile segments. This segmentation allows higher molecular weight BCPs to maintain better kinetic mobility, enabling fast self-assembly rates even as the molecular weight increases to achieve the desired pattern feature density and multiplication
Solution Approach 2:
The patent uses flexible tethered oligo groups that act as flexible segments within the polymer chain, providing local mobility that compensates for the reduced overall chain mobility associated with higher molecular weights. These flexible segments enable the high MW BCPs to still achieve rapid self-assembly kinetics while maintaining the high feature density required for pattern multiplication
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new diblock copolymers enable defect-free assembly with reduced thermal energy and time, facilitating the formation of high-resolution patterns with improved pattern multiplication and rectification in microelectronic devices.
Implementation Method 1
the self-assembly process of this block polymer layer occurs during annealing of this film overlying a neutral layer... During annealing of the block copolymer film, the underlying, neutral layer, directs the nano-phase separation of the block copolymer domains
Implementation Method 2
LOW Tg MULTI-TETHER COPOLYMERIZED DIBLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY... Development of low Tg multi-tethered diblock copolymers synthesized through living anionic polymerization, incorporating oligo-flexible tethered groups or additional low Tg block segments, to enhance kinetic mobility
Data Source
AI summary
Disclosed are two different block copolymer families having general structures (I) or (III), composition thereof, and the process of using these compositions for DSA; wherein B segment and B1 segment are polar block copolymer segments comprising either alkyl 2-methylenealkanoate derived repeating units, lactone derived repeat units, oxirane derived repeat units, oxetane or cyclic carbonate derived repeat units; L and L1 are either a direct valence bond or a linking moiety derived from a 1,1-diarylethene; A segment and A1 are non-polar block copolymer segment comprising styrenic repeat unit, E′, E″ E3 and E4 are different types of end groups, A2 is a block segment derived from an olefin or a diene having a Tg of about −5° C. to about −50° C., and in structure (I) is multi-tethered with oligo flexible tethered groups at various positions as outlined. E′-A-L-B-E″ (I) E3-A1-A2-L1-B1-E4 (III)