Laser-Sustained Plasma Gas Mixture for VUV Emission Control
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Solution Overview
Problem
Laser-sustained plasma (LSP) sources emit broadband radiation that includes undesired wavelengths, which can damage or degrade components, and introducing additional gas components to suppress these wavelengths often introduces secondary radiation issues, limiting their effectiveness.
Innovation Solution
A gas mixture is used in the LSP source that includes a first gas component for broadband radiation and a second gas component to suppress specific wavelengths, with optional third components to further inhibit radiation in undesired spectral regions, thereby controlling the emission spectrum and reducing damage to components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If additional gas components are introduced to suppress undesired wavelengths, then suppression of specific wavelengths is improved, but secondary radiation issues are introduced
Solution Approach 1:
The patent applies parameter changes by carefully controlling the concentration ratios of gas components in the mixture. Specifically, it maintains the second gas component at 0.1-10% concentration and the third gas component at 0.01-1% concentration relative to the first gas component. This precise parameter control allows effective suppression of undesired wavelengths while minimizing the introduction of secondary harmful radiation.
Solution Approach 2:
The patent uses a composite gas mixture comprising multiple gas components (first gas component, second gas component, and third gas component) with specific concentration ranges. This composite approach combines the beneficial effects of each gas component while balancing their potential harmful effects, achieving effective spectral control without excessive secondary radiation.
2Object-affected harmful factors
If a gas mixture is used to suppress undesired wavelengths, then spectral control is improved, but device complexity increases
Solution Approach 1:
The patent simplifies the complex gas mixture problem by defining specific parameter ranges for gas component concentrations. By establishing that the second gas component should be 0.1-10% and the third gas component should be 0.01-1% of the first gas component, the patent transforms a complex composition problem into a manageable parameter control problem with clear design guidelines.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses undesired wavelengths, enhancing the spectral power in desired regions while minimizing damage to the LSP source and its components, improving the overall performance and longevity of the light source.
Implementation Method 1
Laser-sustained plasma sources operate by focusing laser radiation into a gas mixture in order to excite the gas into a plasma state, which is capable of emitting light. This effect is typically referred to as 'pumping' the plasma.
Implementation Method 2
the generated plasma may include one or more undesired wavelengths... the plasma emits broadband radiation
Implementation Method 3
the second gas component is configured to suppress selected wavelengths of radiation associated with the first gas component
Data Source
Figure 1A
Figure 1B
Figure 1C
AI summary
A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.