Machine Tool Chip Antiscatter Mechanism for Dry Machining
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Solution Overview
Problem
Conventional machine tools fail to effectively suppress the scattering of fine chips during machining of materials like graphite, resin, and CFRP, leading to tool wear, reduced tool life, and labor-intensive chip disposal, and are not adaptable to various tool diameters and lengths.
Innovation Solution
A machine tool equipped with a chip antiscatter mechanism that includes chip stirring means to jet gas into the machining region, fluid curtain forming means to create a closed region using a fluid curtain, and discharging means to collect and remove chips, preventing them from scattering outside.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional machine tools are used for dry machining of graphite, resin, and CFRP, then machining precision is maintained, but chips scatter extensively causing tool wear and reduced tool life
Solution Approach 1:
The patent introduces a fluid curtain as an intermediary substance between the machining zone and the surrounding environment. This fluid curtain acts as a mediator that captures and contains chips generated during dry machining, preventing them from scattering while allowing the machining process to continue without coolant interference
Solution Approach 2:
The patent employs pneumatic principles by using a fluid (gas or liquid) curtain generated through controlled flow from nozzles. The fluid curtain utilizes aerodynamic or hydrodynamic forces to create a barrier that effectively contains chips without requiring direct mechanical contact or complex mechanical structures
2Object-generated harmful factors
If liquid is supplied to suppress chip scattering, then chip scattering is reduced, but dry machining cannot be performed on materials like graphite and resin
Solution Approach 1:
The patent applies partial action by using a fluid curtain only at the periphery and upper region where chips tend to scatter, rather than submerging the entire machining zone in liquid. This allows dry machining to continue at the tool-workpiece interface while still providing chip containment where needed
Solution Approach 2:
The fluid curtain serves as an intermediary that provides chip suppression functionality without requiring full liquid immersion. This mediator approach enables the system to achieve chip containment benefits while maintaining the dry machining conditions necessary for processing graphite, resin, and CFRP
3Object-generated harmful factors
If enclosures are used to suppress chip scattering, then chip scattering is reduced, but the machine tool cannot adapt to various tool diameters and lengths
Solution Approach 1:
The patent implements a dynamic fluid curtain system where the fluid flow characteristics can be adjusted in real-time. By controlling fluid pressure, flow rate, and nozzle positioning, the system adapts to different tool diameters and lengths, maintaining effective chip containment across various machining scenarios without requiring physical reconfiguration
Solution Approach 2:
The patent utilizes parameter changes in the fluid curtain system, such as adjusting fluid pressure, flow rate, and nozzle orientation, to accommodate different tool sizes. These parameter adjustments allow the same basic system architecture to effectively suppress chip scattering for various tool diameters and lengths
4Object-affected harmful factors
If conventional chip suppression methods are used, then some chip scattering is reduced, but fine chips from graphite and resin still enter sliding surfaces causing abrasion
Solution Approach 1:
The fluid curtain acts as a fine-mesh intermediary barrier that effectively captures even fine chips generated from graphite and resin machining. The fluid flow creates a continuous barrier that prevents fine particles from escaping and entering sliding surfaces, where they would cause abrasion
Solution Approach 2:
The patent applies local quality by concentrating the fluid curtain precisely at the regions where chips are most likely to scatter toward sliding surfaces. This targeted approach ensures that fine chips are captured at critical locations without requiring excessive fluid consumption or complex system architecture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The machine tool effectively suppresses chip scattering during dry machining of graphite, resin, and CFRP, extending tool life, simplifying chip disposal, and accommodating various tool sizes without requiring frequent equipment changes.
Implementation Method 1
chip stirring means configured to stir the chip by jetting gas into a dry machining region
Implementation Method 2
fluid curtain forming means configured to form a fluid curtain by jetting fluid such as liquid or gas membranously from above to an outside of the dry machining region
Data Source
AI summary
A chip antiscatter mechanism is included and configured to suppress scattering of chips generated during machining of a machining object. The chip antiscatter mechanism includes chip stirring means configured to stir the chips, by jetting a gas into a dry machining region above a table including the machining object, fluid curtain forming means configured to form a fluid curtain by jetting a fluid such as liquid or gas membranously from above to an outside of the dry machining region so as to surround the dry machining region, and to form a closed region including the dry machining region by the membranous fluid curtain, and discharging means configured to receive and discharge the fluid jetted membranously by the fluid curtain forming means.