Macrocrystalline Refractory Cathode Ion Source Stability

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Solution Overview

Problem

Ion sources employing refractory materials face issues with component erosion and efficiency changes over time, leading to unstable output and reduced performance in applications like ion assisted deposition and beamline implanters.

Innovation Solution

The development of ion sources with components made from refractory metals having a macrocrystalline structure, achieved through low-mass ambient annealing at elevated temperatures, which transforms microcrystalline components into macrocrystalline ones with improved properties such as lower work function and higher current output.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If refractory materials are used for ion source components, then component strength and erosion resistance are improved, but output stability and efficiency deteriorate over time

Engineering Contradiction:
Improvecomponent strengthVSAvoidoutput stability
Core Design Contradiction:
StrengthVSReliability

Solution Approach 1:

The patent changes the crystalline structure parameter of refractory materials from microcrystalline to macrocrystalline through controlled annealing processes. This parameter change results in materials with lower work function and more stable emission characteristics, resolving the contradiction between maintaining strength and improving output stability.

Inventive Principle:
Principle #35Parameter changes

2Loss of substance

If refractory materials are used for ion source components, then erosion resistance is improved, but component efficiency deteriorates over time

Engineering Contradiction:
Improveerosion resistanceVSAvoidcomponent efficiency
Core Design Contradiction:
Loss of substanceVSProductivity

Solution Approach 1:

The patent transforms the crystalline structure parameter of refractory materials through annealing, creating macrocrystalline structures that simultaneously provide erosion resistance and maintain efficient electron emission properties over extended operational periods.

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If microcrystalline refractory materials are used, then manufacturing is easier, but work function and current output are suboptimal

Engineering Contradiction:
Improvemanufacturing easeVSAvoidcurrent output
Core Design Contradiction:
Ease of manufactureVSPower

Solution Approach 1:

The patent applies preliminary annealing treatment to transform microcrystalline materials into macrocrystalline structures before final assembly and use. This preliminary action optimizes the material properties for electron emission while maintaining manufacturing feasibility.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent changes the crystalline structure parameter through controlled thermal annealing, transforming materials from microcrystalline to macrocrystalline state. This parameter change optimizes both work function and current output while remaining compatible with existing manufacturing processes.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The macrocrystalline structure results in more stable plasma emission, increased current output, and extended operational life of ion source components, reducing erosion and maintaining efficiency over time.

Implementation Method 1

a cathode disposed in the ion source chamber and configured to emit electrons to generate a plasma within the ion source chamber

Methodology Applied
Scientific EffectThermionic emission: Thermionic Emission

Implementation Method 2

annealing the component body in low-mass ambient at an annealing temperature of at least 1000° C., for a dwell time of at least several hours

Methodology Applied
Scientific EffectAnnealing: Annealing

Data Source

PatentUS11482397B1High output ion source, ion implanter, and method of operation
Publication Date: 2022.10.25 APPLIED MATERIALS INC
  • US11482397B1 patent drawing
  • US11482397B1 patent drawing
  • US11482397B1 patent drawing

AI summary

An ion source is provided. The ion source may include an ion source chamber, and a cathode disposed in the ion source chamber and configured to emit electrons to generate a plasma within the ion source chamber, the cathode comprising a refractory metal, wherein the refractory metal comprises a macrocrystalline structure.