Maglev Substrate Carrier Alignment for Fixed-Mask Deposition

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Solution Overview

Problem

Existing in-line type deposition apparatuses face challenges in achieving high-accuracy alignment of glass substrates and masks due to positional changes during transport, requiring prolonged alignment times, especially when multiple deposition chambers are involved.

Innovation Solution

An alignment apparatus and method utilizing a transport mechanism with a transport carrier and alignment chamber, where magnetic forces controlled by coils and magnets adjust the position of the transport carrier to align the substrate and mask with high precision, enabling accurate positioning without additional alignment means.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If the mask is disposed in a fixed manner in the deposition part, then the apparatus structure is simplified, but alignment accuracy between substrate and mask deteriorates due to position changes during transport

Engineering Contradiction:
Improveapparatus structureVSAvoidalignment accuracy
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent replaces mechanical alignment adjustment mechanisms with a magnetic field-based positioning system. Coils generate magnetic forces to levitate and precisely position the transport carrier holding the substrate, eliminating the need for complex mechanical alignment adjustments while achieving high positioning accuracy during transport to the fixed mask

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the physical state of the transport carrier from contact-based mechanical support to magnetic levitation. By controlling the magnetic field parameters through the coils, the system achieves precise positional control of the substrate without mechanical contact, thereby maintaining alignment accuracy while simplifying the overall apparatus structure

Inventive Principle:
Principle #35Parameter changes

2Device complexity

If alignment is performed after substrate transport to the deposition part, then the apparatus configuration is simplified, but alignment time increases particularly when there are multiple deposition chambers

Engineering Contradiction:
Improveapparatus configurationVSAvoidalignment time
Core Design Contradiction:
Device complexityVSLoss of time

Solution Approach 1:

The patent performs preliminary positioning of the substrate using magnetic levitation during the transport process itself, before the substrate reaches the deposition chamber. This preliminary alignment action occurs continuously during transport, eliminating the need for separate post-transport alignment procedures and reducing total alignment time across multiple deposition chambers

Inventive Principle:
Principle #10Preliminary action

3Object-affected harmful factors

If magnetic levitation is used to transport substrate, then dust and particle generation is prevented, but the apparatus requires additional magnetic control components

Engineering Contradiction:
Improvedust and particle generationVSAvoidmagnetic control components
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The patent designs the coil system to serve multiple functions simultaneously: it generates magnetic forces for levitation to prevent dust and particle generation, and also generates magnetic forces for precise positioning and alignment of the substrate. This multi-functionality reduces the need for separate magnetic control components, thereby limiting the increase in apparatus complexity while achieving the benefit of dust-free transport

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Facilitates high-accuracy alignment of substrates and masks, reducing alignment time and simplifying the apparatus configuration while preventing dust and particle generation, thereby ensuring high-quality film deposition.

Implementation Method 1

a lateral magnetic levitation bearing is used to transport a substrate in the deposition part

Methodology Applied
Scientific EffectMagnetic levitation: Maglev

Implementation Method 2

control means which applies a current or a voltage to a plurality of coils disposed in one of the transport carrier and each transport module to control a magnetic force generated between the plurality of coils and a plurality of magnets disposed in the other one

Methodology Applied
Scientific EffectMagnetic force: Magnetism

Data Source

PatentUS12354894B2Alignment apparatus, deposition apparatus, electronic device manufacturing apparatus, and alignment method
Publication Date: 2025.07.08 CANON TOKKI CORP
  • US12354894B2 patent drawing
  • US12354894B2 patent drawing
  • US12354894B2 patent drawing

AI summary

An alignment apparatus includes: a transport mechanism including a transport carrier which holds and transports a substrate and transport modules which constitute a transport path through which the transport carrier moves; an alignment chamber in which a mask is positioned and fixed to the substrate held by the transport carrier and loaded by the transport mechanism; and control means which applies a current or a voltage to a plurality of coils disposed in one of the transport carrier and each transport module to control a magnetic force generated between the plurality of coils and a plurality of magnets disposed in the other one of the transport carrier and the transport module, wherein the control means adjusts the position of the transport carrier in a state in which the transport carrier holding the substrate has been levitated by controlling the magnetic force to perform positioning.