Maglev Degas Station With Dual Reflector Heating for Uniform Substrates
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Solution Overview
Problem
Existing degas systems in semiconductor processing inefficiently heat substrates, leading to increased power consumption, uneven heating, and potential substrate damage due to localized hotspots.
Innovation Solution
A degas station with a magnetic levitation system and dual heater assemblies, where the heater assemblies include reflectors and heat sources, and are positioned to target the substrate directly, reducing the volume of heated space and promoting uniform heating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by stationary object
If heating elements are disposed at fixed locations within the processing region, then the degas system can heat the substrate, but the heat is not targeted at the substrate, requiring heating of the interior volume of the degas system which increases power consumption
Solution Approach 1:
The heating system uses multiple heating zones with different temperature characteristics (first heating zone with first heating elements, second heating zone with second heating elements) to provide localized heating tailored to different regions of the substrate, thereby reducing overall power consumption by heating only where needed
Solution Approach 2:
The heating elements are made movable rather than fixed, allowing dynamic positioning to target the substrate directly. The system can adjust the position of heating elements to optimize heat delivery and reduce the volume of space requiring heating
2Reliability
If heating elements are disposed at fixed locations, then the degas system can operate, but uneven heating of the substrate occurs which can lead to damage at localized hotspots
Solution Approach 1:
Different heating zones with distinct temperature profiles prevent localized overheating by distributing thermal energy more evenly across the substrate surface, eliminating hotspots that could cause damage
Solution Approach 2:
Temperature sensors monitor the substrate heating process and provide feedback to the control system, which adjusts the heating elements accordingly to maintain uniform temperature distribution and prevent hotspot formation
3Temperature
If the interior volume of the degas system is heated, then the substrate can be heated, but unnecessary heating of chamber components occurs
Solution Approach 1:
The heating system targets specific local regions (substrate area) rather than heating the entire chamber volume, using spatially distributed heating elements that concentrate energy where needed and leave other chamber components at lower temperatures
Solution Approach 2:
The heating system is divided into multiple independent heating zones and elements that can operate separately, allowing selective heating of only the substrate region while minimizing heat transfer to chamber walls and other components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The degas station effectively reduces power consumption, achieves more uniform substrate heating, and minimizes the risk of substrate damage by concentrating heat directly on the substrate.
Implementation Method 1
a magnetic levitation system coupled to the housing configured to levitate and move a carrier within the housing
Implementation Method 2
a first heat source coupled to reflector... a second heat source coupled to the second reflector
Implementation Method 3
The first heater assembly includes a first support, a first reflector disposed within the housing by the first support, and a first heat source coupled to reflector
Data Source
AI summary
Degas stations for degassing substrates that are conveyed through a substrate processing system on a magnetically levitated carrier and related methods are provided. The degas station includes a housing, a magnetic levitation system coupled to the housing configured to levitate and move a carrier within the housing, a first heater assembly and a second heater assembly. The first heater assembly is disposed in the housing. The first heater assembly includes a first support, a first reflector disposed within the housing by the first support, and a first heat source coupled to reflector. The second heater assembly is disposed in the housing above the first heater assembly. The second heater assembly includes a second support, a second reflector disposed within the housing by the second support, and a second heat source coupled to the second reflector. At least one substrate support member is disposed between the first heater assembly and the second heater assembly.