Magnetically Levitated Drag Pump for Semiconductor Vacuum

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Solution Overview

Problem

Existing vacuum pumps are ineffective across a wide pressure range, particularly in semiconductor processing chambers that require pressures between 0.05 mbar and 0.2 mbar, where turbo pumps overheat and roots blowers are not effective due to conduit conductance limitations.

Innovation Solution

A vacuum pump design featuring a rotor with angled blades on a magnetically levitated bearing, combined with a stator comprising perforated elements with varying transparency along the helical path, allowing for effective pumping across the transitional flow regime and enabling the use of a backing pump for higher pressures.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a turbo pump is used to evacuate the chamber, then high vacuum can be achieved, but the pump overheats at pressures above 0.05 mbar

Engineering Contradiction:
Improvevacuum levelVSAvoidpump temperature
Core Design Contradiction:
Measurement precisionVSTemperature

Solution Approach 1:

The pumping system is segmented into multiple stages with different pump types operating in different pressure ranges. The drag pump handles the transitional flow regime (0.05-0.2 mbar), while the turbo pump handles high vacuum, preventing the turbo pump from overheating by limiting its operation to appropriate pressure ranges.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The drag pump acts as an intermediary device between the chamber and the turbo pump, conditioning the pressure range to protect the turbo pump from operating in its overheating zone. This intermediary pump ensures the turbo pump receives gas at acceptable temperatures and pressures.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Stress or pressure

If a roots blower is used as a backing pump, then it can handle high pressures, but it is not effective at pressures below 0.2 mbar due to conduit conductance limitations

Engineering Contradiction:
Improvepressure rangeVSAvoidpumping speed
Core Design Contradiction:
Stress or pressureVSProductivity

Solution Approach 1:

The drag pump is positioned locally close to the chamber with a short conduit, optimizing its performance in the transitional flow regime where it operates most effectively. This local placement maximizes pumping speed at pressures below 0.2 mbar by minimizing conduit conductance limitations.

Inventive Principle:
Principle #3Local quality

3Power

If the rotor rotates close to the stator to optimize compression ratio, then compression is improved, but the stator channel depth is limited which reduces pumping capacity

Engineering Contradiction:
Improvecompression ratioVSAvoidpumping capacity
Core Design Contradiction:
PowerVSProductivity

Solution Approach 1:

The patent introduces transparency as a new dimension for optimizing drag pump performance. By controlling the transparency of the stator (through perforations or mesh structures), the pump achieves effective compression without requiring the rotor to rotate extremely close to the stator, thereby maintaining adequate stator channel depth for sufficient pumping capacity.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The pump achieves high pumping speed at low pressures and effective operation at higher pressures when backed by another pump, providing a reasonable capacity and efficient evacuation of semiconductor processing chambers across a wide pressure range.

Implementation Method 1

a rotor with angled blades on a magnetically levitated bearing

Methodology Applied
Scientific EffectMagnetic levitation: Maglev

Implementation Method 2

As the gas flows through the pump it is compressed and this compression means that the open or transparent area can be reduced towards the outlet

Methodology Applied
Scientific EffectGas compression: Compression

Data Source

PatentEP4088034B1Vacuum pump, vacuum pump set for evacuating a semiconductor processing chamber and method of evacuating a semiconductor processing chamber
Publication Date: 2025.03.05 EDWARDS LTD
  • EP4088034B1 patent drawingFigure 1
  • EP4088034B1 patent drawingFigure 2
  • EP4088034B1 patent drawingFigure 3

AI summary

A vacuum pump, vacuum pump set and method for evacuating a semiconductor processing chamber is disclosed. The vacuum pump is configured for mounting to a semiconductor processing chamber to evacuate the chamber to pressures between 1 mbar and 5 X10-2 mbar. The vacuum pump comprises: a rotor rotatably mounted within a stator. The rotor comprises a plurality of angled blades arranged along a helical path from an inlet to an outlet. The stator comprises a plurality of perforated elements arranged to intersect the helical path, the perforations allowing gas molecules travelling along the helical path to pass through the perforated elements. The rotor mounted on a magnetically levitated bearing; and the perforated elements located towards an inlet of the vacuum pump comprise a transparency of more than 40% and the perforated elements located towards an outlet of the vacuum pump comprise a transparency of more than 30%.