Maglev Substrate Transfer for Low-Particle Semiconductor Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate transfer systems in semiconductor processing face challenges with particle generation, large footprint, and limited throughput due to mechanical robots and conveyors, which affect vacuum integrity and processing efficiency.
Innovation Solution
The use of magnetic levitation assemblies to convey and transfer substrates within a substrate processing system, eliminating mechanical robots and conveyors, thereby reducing particle generation, footprint, and increasing throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If conventional mechanical robots are used for substrate transfer, then substrate transfer function is achieved, but particle generation increases and footprint enlarges
Solution Approach 1:
The patent replaces mechanical robots with a magnetic field-based transfer mechanism. The substrate carrier is levitated and transferred using magnetic forces between process chambers without mechanical contact, eliminating particle generation from mechanical components while maintaining the substrate transfer function.
Solution Approach 2:
The patent extracts and removes the mechanical robot components from the system entirely. By using magnetic fields for substrate carrier transfer, the harmful mechanical parts that generate particles are taken out of the vacuum environment, reducing contamination while preserving the essential transfer capability.
2Object-generated harmful factors
If conventional mechanical conveyors are used for substrate transfer, then substrate transfer function is achieved, but particle generation increases and maintenance requirements increase
Solution Approach 1:
The patent substitutes mechanical conveyors with a magnetic field-based transfer system. The substrate carrier moves through the vacuum environment using magnetic forces without mechanical contact with conveyor components, eliminating particle generation and reducing maintenance needs for vacuum-compatible mechanical parts.
3Ease of operation
If conventional robots rotate and extend into process chambers, then substrate transfer is achieved, but footprint of central region increases
Solution Approach 1:
The patent replaces the rotating and extending mechanical robot arms with a magnetic field-based transfer system. The substrate carrier is levitated and moved horizontally between process chambers using magnetic forces, eliminating the need for large central region space required by conventional robot mechanisms.
4Productivity
If conventional conveyors move in one direction at a time, then substrate transfer is achieved, but throughput is limited
Solution Approach 1:
The patent implements a dynamic magnetic field control system that can independently control the movement of multiple substrate carriers in different directions simultaneously. The magnetic field strength and direction are dynamically adjusted to enable bidirectional transfer, increasing system throughput without requiring physical conveyor reconfiguration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Magnetic levitation reduces particle contamination, minimizes system footprint, and enhances processing efficiency by up to 50% through improved substrate handling, leading to reduced capital and operational costs.
Implementation Method 1
a magnetic levitation assembly disposed in the transport region configured to levitate and propel a substrate carrier
Implementation Method 2
The magnetic levitation assembly includes a first track segment including first rails disposed in the transport region and below the process region, wherein the first rails each include a first plurality of magnets
Data Source
AI summary
A substrate process station includes a housing including a transport region and process region. The process station further includes a magnetic levitation assembly disposed in the transport region configured to levitate and propel a substrate carrier. The magnetic levitation assembly includes a first track segment including first rails disposed in the transport region and below the process region, wherein the first rails each include a first plurality of magnets. The process station further includes a pedestal assembly comprising a pedestal disposed within the housing. The pedestal is moveable between a pedestal transfer position and a process position, wherein the pedestal is disposed between the first rails in the pedestal transfer position to receive a substrate from the substrate carrier, and wherein the pedestal is moveable between the first rails to position the received substrate in the process region in the process position.