Maglev Wafer Transport Module With Switchable Vertical Passage
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Solution Overview
Problem
Existing substrate transport systems in semiconductor wafer processing face challenges in efficiently and flexibly moving substrates between processing chambers, particularly in changing the transport module's posture and navigating through narrow passages, which can lead to increased apparatus size and complexity.
Innovation Solution
A substrate transport apparatus utilizing magnetic levitation with a movable transport module and an angle adjusting mechanism that switches the movement surface between horizontal and vertical angles, allowing the module to float and move along different surfaces, thereby reducing the floor area required for the transport chamber and improving transport efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a substrate transport system uses a fixed horizontal movement surface, then the structure is simple, but the apparatus cannot efficiently navigate narrow passages and requires large floor area
Solution Approach 1:
The movement surface is designed to dynamically change its angle between horizontal and vertical positions. This allows the transport module to navigate narrow passages by moving vertically, then return to horizontal for substrate transfer, eliminating the need for large floor area while maintaining operational simplicity
Solution Approach 2:
The system introduces vertical movement capability by changing the movement surface angle to 90 degrees, allowing substrates to be transported through the vertical dimension in narrow passages rather than requiring extensive horizontal space, thus optimizing the floor area utilization
2Adaptability or versatility
If the transport module moves on a horizontal surface only, then the mechanism is simple, but the system lacks flexibility in posture changes and cannot optimize passage navigation
Solution Approach 1:
The angle adjusting mechanism enables the movement surface to dynamically switch between horizontal and vertical orientations, providing the transport module with adaptable posture changes to navigate different passage configurations and optimize substrate transport flexibility
Solution Approach 2:
The single movement surface serves multiple functions by changing its angle: it acts as a horizontal transport path for substrate transfer and as a vertical passage for navigating narrow areas, eliminating the need for separate mechanisms and reducing overall system complexity despite the added angular adjustment capability
3Productivity
If multiple transport modules share a narrow passage, then space utilization is improved, but interference between modules increases without proper angle adjustment
Solution Approach 1:
By dynamically adjusting the movement surface angle, the system allows multiple transport modules to occupy the same physical space at different times and orientations. When one module uses the passage vertically at 90 degrees, others can use it horizontally, enabling high throughput without interference
Solution Approach 2:
The angle adjusting mechanism operates periodically to switch between horizontal and vertical configurations, allowing multiple modules to cycle through the shared passage in an organized sequence, maximizing space utilization while preventing conflicts through timed angular transitions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables efficient substrate transport with reduced floor area requirements, enhanced flexibility in transport module posture changes, and improved throughput by allowing multiple modules to pass through shared passages without interference, thus optimizing the layout and operation of wafer processing systems.
Implementation Method 1
a substrate transport module (20) accommodated in the substrate transport chamber (120) to hold the substrate W, and including a second magnet (35) to which a magnetic force acting between the first magnet (15) and the second magnet (35) is applied, in a state of floating from the movement surface (10) using the magnetic force
Data Source
AI summary
An apparatus for transporting a substrate includes a transport chamber including a wall having an opening through which carry-in/out of the substrate to/from the substrate processing chamber is performed and a movement surface having a first magnet, a transport module accommodated in the transport chamber to hold the substrate, including a second magnet to which a magnetic force is applied, and configured to be movable along the movement surface in a floating state from the movement surface, an angle adjusting mechanism provided in the transport chamber to switch an angle of the movement surface between a first angle and a second angle which is closer to a vertical state than the first angle, and a transport passage forming a portion of the transport chamber, and including the movement surface at the second angle to which the movement surface switched to the second angle can be connected.