Magnetic Baffle Plate Drive for Clean Plasma Processing
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Solution Overview
Problem
Existing substrate processing apparatuses face contamination issues due to the need for gears and greases within the chamber to drive baffle plates, which complicates the plasma processing and affects the cleanliness and efficiency of the process.
Innovation Solution
A substrate processing apparatus is designed with a first and second annular baffle plate system, where the second annular baffle plate is rotated and positioned using magnetic structures and non-contact gears external to the chamber, eliminating the need for internal gears and greases, thereby reducing contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If gears and greases are used within the chamber to drive baffle plates, then the baffle plates can be driven and positioned, but contamination occurs in the plasma processing environment
Solution Approach 1:
The patent replaces the traditional mechanical gear-driven system with a magnetic field-based drive system. Magnets are attached to the baffle plate, and a magnetic drive mechanism positioned outside the chamber uses magnetic attraction and repulsion forces to rotate the baffle plate without any mechanical contact through the chamber wall. This eliminates gears and greases from the plasma environment, resolving the contamination issue while maintaining full driving capability.
2Object-affected harmful factors
If magnetic structures are used to drive the baffle plate from outside the chamber, then contamination is reduced, but the device complexity increases
Solution Approach 1:
The patent extracts the drive mechanism from inside the plasma chamber and positions it outside. The magnetic drive components (motors, magnetic coupling mechanisms) are located in the ambient environment, while only simple magnets are attached to the baffle plate itself. The magnetic field serves as the transmission medium through the chamber wall, allowing the complex components to be removed from the plasma environment while maintaining the driving function.
3Object-affected harmful factors
If non-contact magnetic drive is used, then the cleanliness and efficiency of plasma processing is improved, but precise control of baffle plate position becomes more challenging
Solution Approach 1:
The patent incorporates sensors (such as position sensors or encoders) that monitor the baffle plate's angular position and provide real-time feedback to the control system. The controller adjusts the magnetic drive signals based on this feedback to achieve and maintain the desired position. This closed-loop control system ensures precise positioning despite the non-contact nature of the magnetic drive mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the cleanliness and efficiency of the plasma processing by minimizing contamination within the chamber and simplifying the baffle plate movement, allowing for precise control of the plasma processing environment.
Implementation Method 1
a first actuator configured to rotate the first magnetic structure in a horizontal direction by rotating the second magnetic structure in the horizontal direction and to rotate the second annular baffle plate in the horizontal direction with respect to the first annular baffle plate by the rotation of the first magnetic structure in the horizontal direction
Data Source
AI summary
A substrate processing apparatus includes a first annular baffle plate that is disposed between a substrate support and a sidewall of a chamber, a second annular baffle plate that is disposed to overlap the first annular baffle plate in a vertical direction and includes a first magnetic structure, and a first driving unit that is disposed outside the chamber, and includes a first actuator that is configured to rotate the first magnetic structure in a horizontal direction by rotating the second magnetic structure in the horizontal direction and to rotate the second annular baffle plate in the horizontal direction with respect to the first annular baffle plate by the rotation of the first magnetic structure in the horizontal direction.