Magnetic Contact Materials for Wear Particle Control in EUV Lithography
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Solution Overview
Problem
Current techniques fail to effectively prevent wear particles generated from components in contact within semiconductor manufacturing systems, particularly in extreme ultraviolet (EUV) lithography, where existing methods like pellicles are impractical due to light absorption, and alternative methods like electrostatic or electromagnetic levitation are costly and inefficient.
Innovation Solution
Forming at least one component out of a magnetic material so that wear particles are magnetic, allowing a magnetic field to attract and collect these particles, thereby preventing contamination in semiconductor manufacturing systems.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If conventional materials are used for components in contact, then wear particles are generated through abrasion, adhesion, and fatigue, but using magnetic materials allows particles to be attracted and collected by a magnetic field, preventing contamination
Solution Approach 1:
The patent converts the harmful wear particles into beneficial magnetic particles by using magnetic materials. The particles generated through abrasion, adhesion, and fatigue are now magnetic and can be attracted and collected by a magnetic field, transforming the harmful contamination problem into a controllable and removable situation.
Solution Approach 2:
The patent introduces a magnetic field as an intermediary between the wear particles and the system environment. This magnetic field acts as a mediator that captures and holds the magnetic particles, preventing them from contaminating critical components while allowing the mechanical contact to continue functioning.
2Object-affected harmful factors
If pellicles are used to protect reticles from particle contamination, then particles are blocked from reaching the reticle, but pellicles are impractical for EUV lithography due to light absorption
Solution Approach 1:
The patent replaces the mechanical pellicle system with a magnetic field-based particle control system. Instead of using a physical barrier (pellicle) that blocks EUV light, the system uses magnetic fields to attract and collect magnetic particles, allowing EUV light to pass through unaffected while still preventing reticle contamination.
3Object-generated harmful factors
If electrostatic or electromagnetic levitation is used to prevent particle generation, then contact between components is eliminated, but these methods are costly and inefficient
Solution Approach 1:
The patent enables the system to self-manage wear particles by making them magnetic and using magnetic fields for automatic attraction and collection. This self-service approach eliminates the need for complex external levitation systems, reducing both cost and complexity while effectively preventing particle generation issues.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The magnetic field effectively attracts and collects wear particles, reducing contamination in semiconductor manufacturing systems, especially in EUV lithography, by ensuring particles are drawn away from critical components, thus maintaining a clean environment.
Implementation Method 1
a magnetic element positioned adjacent to the first component and the second component, the magnetic element configured to generate a magnetic field in the vicinity of the first and the second components
Implementation Method 2
Magnetic particles are generated when the first component and the second component are in contact and are then moved in a direction of high flux density created by the magnetic element
Data Source
AI summary
Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the component are magnetic themselves. Then a magnetic field is used to attract the particles. In one embodiment, the particles are attracted to and collected by a magnet. In this way, the particles are drawn away from any components that might be contaminated. In some embodiments, the magnetic component is also magnetized. In other embodiments, a magnet is placed in contact with the magnetic component. In other embodiments, each of the components that come into contact with each other are formed of a magnetic material.