Magnetic Core Structure With Protective Region for Wet-Etch Precision

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Solution Overview

Problem

The fabrication of thick magnetic cores for inductor devices faces challenges with dry-etching being impractical due to high costs and low throughput, while wet-etching results in severe undercutting, reducing inductor performance.

Innovation Solution

A semiconductor device and method involving a substrate with a protective region and a core structure etchable by a chemical solution, where the protective region is resistant to etching, allowing for isotropic wet-etching that prevents lateral etching and maintains the core's thickness and adhesion, using photo-sensitive polyimide (PSPI) for protection and patterning.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If wet-etching is used to fabricate thick magnetic cores, then manufacturing cost and throughput are improved, but severe undercutting occurs that reduces inductor performance

Engineering Contradiction:
ImprovethroughputVSAvoidcore shape precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

A protective layer is formed over the magnetic core material before etching. This preliminary protective action prevents the etchant from attacking the sidewalls of the core, thereby avoiding undercutting while allowing the use of wet-etching for high throughput production.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The protective layer acts as an intermediary between the etchant and the magnetic core material. It selectively protects the core sidewalls from the etchant while allowing etching to proceed in other directions, thus maintaining core shape precision during wet-etching.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If dry-etching is used to fabricate thick magnetic cores, then manufacturing precision is improved, but cost increases and throughput decreases

Engineering Contradiction:
Improvecore shape precisionVSAvoidthroughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

A disposable protective layer is applied temporarily during the etching process to enable the use of cost-effective wet-etching. The protective layer is removed after etching, having served its purpose of preventing undercutting during the low-cost, high-throughput wet-etching process.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

3Ease of manufacture

If wet-etching is used to fabricate thick magnetic cores, then manufacturing cost is reduced, but severe undercutting occurs that reduces adhesion

Engineering Contradiction:
Improvemanufacturing costVSAvoidcore adhesion
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The protective layer is applied before etching to prevent undercutting at the interface between the magnetic core and the underlying layer. This preliminary protection maintains strong adhesion by preventing the etchant from creating gaps or weak interfaces during the low-cost wet-etching process.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the fabrication of thick core structures with improved adhesion and reduced side wall roughness, enhancing inductor performance by preventing lateral etching and maintaining magnetic properties, thus allowing for better inductance and reliability.

Implementation Method 1

wet-etching of a thick magnetic core may result in severe undercutting

Methodology Applied
Scientific EffectWet-etching:

Implementation Method 2

The protective region may include a protective material resistant to etching by the chemical solution

Methodology Applied
Scientific EffectEtching resistance:

Data Source

PatentUS12068359B2Semiconductor devices and methods of fabricating a semiconductor device
Publication Date: 2024.08.20 GLOBALFOUNDRIES SINGAPORE PTE LTD
  • US12068359B2 patent drawing
  • US12068359B2 patent drawing
  • US12068359B2 patent drawing

AI summary

A semiconductor device may include: a substrate; a protective region provided over the substrate; and a core structure enclosed by the protective region. The core structure may include a core material etchable by a chemical solution. The protective region may include a protective material resistant to etching by the chemical solution. The core structure may have a first side and a second side opposite to the first side, the first side being closer to the substrate than the second side. The core structure may be narrowest at the first side of the core structure.